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Optimization design of combined brightfield and darkfield illumination system for machine vision measurement
Modern Applied Optics | 更新时间：2025-12-02

    • Optimization design of combined brightfield and darkfield illumination system for machine vision measurement

    • “In the field of machine vision measurement, experts have established an illuminance distribution model for a compound lighting system with bright and dark fields. Improved algorithms are used to optimize the arrangement of light sources, effectively improving the uniformity of illumination in the target area.”
    • Optics and Precision Engineering   Vol. 33, Issue 20, Pages: 3203-3213(2025)

    • DOI：10.37188/OPE.20253320.3203    

      CLC： TH701;TB811+.1
    • CSTR：32169.14.OPE.20253320.3203    

    • Received：27 July 2025，

      Revised：2025-09-11，

      Published：25 October 2025

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  • HAO Fei,GU Zhipeng,GUAN Hongyao,et al.Optimization design of combined brightfield and darkfield illumination system for machine vision measurement[J].Optics and Precision Engineering,2025,33(20):3203-3213. DOI： 10.37188/OPE.20253320.3203. CSTR： 32169.14.OPE.20253320.3203.

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