任延同. 离子刻蚀技术现状与未来发展[J]. 光学精密工程, 1998,(2): 7-14

REN Yan-Tong . Presence and Future Developing Tendency of Ion etching Technology[J]. Editorial Office of Optics and Precision Engineering, 1998,(2): 7-14

任延同. 离子刻蚀技术现状与未来发展[J]. 光学精密工程, 1998,(2): 7-14 DOI：

REN Yan-Tong . Presence and Future Developing Tendency of Ion etching Technology[J]. Editorial Office of Optics and Precision Engineering, 1998,(2): 7-14 DOI：