Development of Debris-free Laser Plasma Sources for EUV Lithography in CIOMP
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Development of Debris-free Laser Plasma Sources for EUV Lithography in CIOMP
Development of Debris-free Laser Plasma Sources for EUV Lithography in CIOMP
光学精密工程2001年9卷第5期 页码:442-445
作者机构:
State Key Laboratory of Applied Optics, Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences, Changchun, 130022, China
作者简介:
基金信息:
DOI:
中图分类号:TN305.7
收稿日期:2001-08-29,
修回日期:2001-09-22,
网络出版日期:2001-10-15,
纸质出版日期:2001-10-15
稿件说明:
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CHEN Bo, NI Qi-liang, CAO Jian-lin . Development of Debris-free Laser Plasma Sources for EUV Lithography in CIOMP[J]. 光学精密工程, 2001,(5): 442-445
CHEN Bo, NI Qi-liang, CAO Jian-lin . Development of Debris-free Laser Plasma Sources for EUV Lithography in CIOMP[J]. Editorial Office of Optics and Precision Engineering, 2001,(5): 442-445
CHEN Bo, NI Qi-liang, CAO Jian-lin . Development of Debris-free Laser Plasma Sources for EUV Lithography in CIOMP[J]. 光学精密工程, 2001,(5): 442-445DOI:
CHEN Bo, NI Qi-liang, CAO Jian-lin . Development of Debris-free Laser Plasma Sources for EUV Lithography in CIOMP[J]. Editorial Office of Optics and Precision Engineering, 2001,(5): 442-445DOI:
Development of Debris-free Laser Plasma Sources for EUV Lithography in CIOMP