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Development of Debris-free Laser Plasma Sources for EUV Lithography in CIOMP
论文 | 更新时间:2020-08-12
    • Development of Debris-free Laser Plasma Sources for EUV Lithography in CIOMP

    • Development of Debris-free Laser Plasma Sources for EUV Lithography in CIOMP

    • 光学精密工程   2001年9卷第5期 页码:442-445
    • 中图分类号: TN305.7
    • 收稿日期:2001-08-29

      修回日期:2001-09-22

      网络出版日期:2001-10-15

      纸质出版日期:2001-10-15

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  • CHEN Bo, NI Qi-liang, CAO Jian-lin . Development of Debris-free Laser Plasma Sources for EUV Lithography in CIOMP[J]. 光学精密工程, 2001,(5): 442-445 DOI:

    CHEN Bo, NI Qi-liang, CAO Jian-lin . Development of Debris-free Laser Plasma Sources for EUV Lithography in CIOMP[J]. Editorial Office of Optics and Precision Engineering, 2001,(5): 442-445 DOI:

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Hiroo Kinoshita

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Laboratory-of Advanced Science-and Technology-for Industry Himeji Institute-of Technology, 3-1-2 Kouto, Kamigori, Ako-, Hyogo
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