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国防科技大学, 机电工程与自动化学院机电所, 湖南, 长沙, 410073
收稿日期:2003-11-29,
修回日期:2004-01-28,
网络出版日期:2004-06-15,
纸质出版日期:2004-06-15
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尤伟伟, 彭小强, 戴一帆. 磁流变抛光液的研究[J]. 光学精密工程, 2004,(3): 330-334
YOU Wei-wei, PENG Xiao-qiang, DAI Yi-fan. MR fluids for finishing use[J]. Editorial Office of Optics and Precision Engineering, 2004,(3): 330-334
介绍了磁流变抛光的原理和特点
并由此提出了适于抛光的磁流变液的评价标准
根据这一标准选取了磁流变液的各组分
配制出了标准的光学抛光用磁流变抛光液.通过自行研制的磁流变仪测得该磁流变液在磁场为600mT
剪切率为110rad/s时的剪切屈服应力达到70kPa.用所配磁流变液对K9玻璃进行抛光实验
试验结果表明
磁流变抛光的材料最大去除率为0.4μm/min.
The principle and characteristics of magnetorheological finishing(MRF)are introduced
and a standard is suggested for evaluation of MR fluid finishing of optical glass. The elements of MR fluid were chosen according to the standard and MR fluid was prepared for optical finishing. The yield stress of this MR fluid is 70 kPa at a shear rate of 110 rad/s and in a magnetic field of 600 mT. An experimental finishing was conducted with K9 optical glass using the developed MR fluid
and experimental results show that the maximum removal rate of optical glass is 0.4 μm/min.
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