空间用碳化硅反射镜的设计制造与测试

张剑寒; 张宇民; 韩杰才; 赫晓东; 姚 旺

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空间用碳化硅反射镜的设计制造与测试

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- 空间用碳化硅反射镜的设计制造与测试
- Design, fabrication and testing of space-borne SiC mirror
- 光学精密工程 2006年14卷第2期页码：179-182
- 作者机构：
  
  哈尔滨工业大学复合材料与结构研究所,黑龙江哈尔滨,150001
- 作者简介：
- 基金信息：
- DOI：
  中图分类号： TH703
- 收稿日期：2005-10-15，
  
  修回日期：2005-12-24，
  
  网络出版日期：2006-04-30，
  
  纸质出版日期：2006-04-30
- 稿件说明：
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张剑寒, 张宇民, 韩杰才, 等. 空间用碳化硅反射镜的设计制造与测试[J]. 光学精密工程, 2006,14(2):179-182.

ZHANG Jian-han, ZHANG Yu-min, HAN Jie-cai, et al. Design, fabrication and testing of space-borne SiC mirror[J]. Optics and precision engineering, 2006, 14(2): 179-182.
张剑寒, 张宇民, 韩杰才, 等. 空间用碳化硅反射镜的设计制造与测试[J]. 光学精密工程, 2006,14(2):179-182. DOI：

ZHANG Jian-han, ZHANG Yu-min, HAN Jie-cai, et al. Design, fabrication and testing of space-borne SiC mirror[J]. Optics and precision engineering, 2006, 14(2): 179-182. DOI：

摘要

碳化硅由于其优异的机械性能和热物理性能而成为颇具吸引力的反射镜材料。采用反应烧结碳化硅(RB-SiC)材料制备了空间用反射镜体

用化学气相沉积(CVD)工艺在镜体镜面沉积一层致密的碳化硅薄膜

反射镜采用蜂窝状背面开放式轻量化结构。对直径为250 mm反射镜的组织、性能做了一系列研究测试。结果表明:反射镜体为Si/SiC两相组织

薄膜为单相SiC

反射镜的机械、热性能优异

薄膜与基体结合强度为345.5 MPa

研磨后镜面表面粗糙度达到1.487 nm rms。采用本文工艺方法有能力制备米级直径的空间用碳化硅反射镜。

Abstract

Silicon carbide (SiC) is an attractive mirror material due to its superior mechanical and thermal physical properties compared to conventional optical materials. In this paper

a space-borne mirror blank was fabricated by reaction bonded silicon carbide (RB-SiC)

and full density SiC thin film was coated on the surface of mirror blank by Chemical Vapor Deposition(CVD) process. The space-borne mirror is lightweight structure with honeycomb back opened. The microstructure and properties of a 250 mm diameter circular mirror were studied and tested.Experimental results show that the mirror blank is Si/SiC two-phase structure and the film is SiC single phase; SiC mirror has excellent mechanical and thermal property; the adhesion strength stress between substrate and film is 345.5 MPa. After grinding

mirror surface precision is 1.487 nm rms. The space-borne SiC mirror of meter class diameter can be fabricated by both reaction bonded and CVD process.

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references

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