Exposure optical system in lithographic main scale of absolute optical encoder

LIU Hua; LU Zhen-wu; XIONG Zheng; WANG Yao; WANG He; HUANG Jian-bo; TAN Xiang-quan; SUN Qia

doi:10.3788/OPE.20142207.1814

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Exposure optical system in lithographic main scale of absolute optical encoder

更新时间：2020-08-13

- Exposure optical system in lithographic main scale of absolute optical encoder
- Optics and Precision Engineering Vol. 22, Issue 7, Pages: 1814-1819(2014)
- 作者机构：
  
  1. 中国科学院大学北京,中国,100049
  2. 中国科学院长春光学精密机械与物理研究所光电技术研发中心,吉林长春,130033
- 作者简介：
- 基金信息：
- DOI：10.3788/OPE.20142207.1814
  CLC： TN305.7
- Received：12 November 2013，
  
  Revised：08 December 2013，
  
  Published：25 July 2014
- 稿件说明：
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刘华, 卢振武, 熊峥等. 绝对式光栅尺母尺刻划曝光系统[J]. 光学精密工程, 2014,22(7): 1814-1819

LIU Hua, LU Zhen-wu, XIONG Zheng etc. Exposure optical system in lithographic main scale of absolute optical encoder[J]. Editorial Office of Optics and Precision Engineering, 2014,22(7): 1814-1819
刘华, 卢振武, 熊峥等. 绝对式光栅尺母尺刻划曝光系统[J]. 光学精密工程, 2014,22(7): 1814-1819 DOI： 10.3788/OPE.20142207.1814.

LIU Hua, LU Zhen-wu, XIONG Zheng etc. Exposure optical system in lithographic main scale of absolute optical encoder[J]. Editorial Office of Optics and Precision Engineering, 2014,22(7): 1814-1819 DOI： 10.3788/OPE.20142207.1814.

摘要

提出了基于数字微镜器件（DMD）的双曝光头总体结构，该结构可同时刻划母尺的周期和非周期两个光栅码道。单曝光头包含曝光光源、调焦光源、DMD和投影镜头四部分，曝光光源由激光器、准直镜组、二维微透镜阵列和场镜组成。本文利用光学软件TracePro设计该光源，实现了能量的平顶分布，在14 mm×10 mm的照明面上均匀性达到95%以上。利用光学软件Zemax设计了工作在双波段（曝光光源0.403~0.407 μm和调焦光源0.525~0.535 μm）的共焦投影镜头，采用了二向色镜和分光棱镜使其能在曝光的同时进行实时调焦，优化后的系统在曝光波段和调焦波段均达到衍射极限，最大畸变为0.009%。与传统的光栅尺刻划技术对比，设计的曝光系统具有工艺简单、制作速度快、精度高等优势，可用于长、超长计量光栅的制作。

Abstract

A general structure for two photolithographic heads based on Digital Micro-mirror Devices(DMDs) is proposed for simultaneously lithography of the double-track codes of an absolute optical encoder.The total optical system includes an exposure light source

an focusing light source

a DMD and a projective lens.The exposure light source mainly consists of a laser

a collimation lens

a 2D-micro-mirror array and a field lens.The exposure light source is designed by TracePro software

and the uniformity of the energy distribution is above 95% in the area of 14 mm×10 mm.A confocal projective system at two wavebands (exposure source at 0.403-0.407μm and focusing source at 0.525-0.535 μm) is designed by Zemax software

in which the exposure and focusing can be realized in real time with a dichroscope and a prism.The imaging quality of the projective lens reaches diffraction limit at exposure waveband and focusing waveband

and the maximum distortion is 0.009%.Compared with traditional grating lithography methods

the exposure optical system has advantages on simpler process

fast manufacturing and high precision.It can be used in manufacturing long and ultra-long metrological gratings.

关键词

Keywords

references

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郭小伟. SLM无掩模光刻技术的研究. 四川:四川大学,2007. GUO X W. Research on SLM-based Maskless Lithography. Sichuan: Sichuan University,2007,(in Chinese)

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KIN F C,FENG ZH Q,YANG R,et al. High-resolution maskless Lithography[J]. SPIE,2003,2:331-339.

KENNETH C,JOHNSON. High-throughput maskless lithograpy system. U. S:6177980,2001.

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