GONG Xue-peng, LU Qi-peng, PENG Zhong-qi. Design and testing of deflecting mirror system of X-ray interference lithography beamline[J]. Editorial Office of Optics and Precision Engineering, 2014,22(8): 2142-2150
GONG Xue-peng, LU Qi-peng, PENG Zhong-qi. Design and testing of deflecting mirror system of X-ray interference lithography beamline[J]. Editorial Office of Optics and Precision Engineering, 2014,22(8): 2142-2150 DOI: 10.3788/OPE.20142208.2142.
Design and testing of deflecting mirror system of X-ray interference lithography beamline
The X-ray interference lithography (XIL) beamline at Shanghai Synchrotron Radiation Facility was introduced. To achieve the beam deflection and optical pathway switch of the beamline
a deflecting mirror system of XIL beamline was designed. The function of the deflecting mirror system was analyzed and its adjusting mechanism
switching mechanism and cooling structure were designed respectively. The key movement of adjusting mechanism was discussed
which is the translating process of a linear motion outside the mirror chamber into a rotary motion in ultra high vacuum.Then
the relationship between repeatability and carrying capacity of the switching mechanism was analyzed
and the strength of precision screw was checked. A cooling structure was designed by integrating a mirror support mode and a cooling mode
and the cooling effect was analyzed by numerical simulation method. The simulated results show that the meridian direction slope error and the sagittal direction slope error of the deflection mirror are about 6.5 rad and 7 rad respectively. The precisions of adjusting mechanism and switching mechanism were tested by a laser interferometer and a photoelectric autocollimator
and testing results show that linear resolution capability of adjusting mechanism is up to 0.2 μm
and the repeatability of switching mechanism satisfies the technical demands.
关键词
Keywords
references
SCHATTENBURG M L,AUCOIN R J,FLEMING R C,et al.. Fabrication of high-energy X-ray transmission gratings for the Advanced X-ray Astrophysics Facility (AXAF)[J]. SPIE, 1994, 2280: 181-190.
GEORGE R B. Electron-Beam Technology in Microelectronics Fabrication[M].Newyork:Academic Press,1980:11-16.
HIRSCHER S,KVMMEL M,KIRCH O, et al.. Ion projection lithography below 70 nm: tool performance and resist process [J]. Microelectronic Engineering. 2002, 61-62: 301-307.
RESNICK D J,DAUKSHER W J. Imprint lithography: lab curiosity or the real NGL[J]. SPIE Microlithography Conference, 2003, 12-23.
HEYDERMAN L J, SOLAK H H,DAVID C, et al.. Arrays of nanoscale magnetic dots: Fabrication by x-ray interference lithography and characterization [J]. Appl.Phys.Lett., 2004, 85: 4989-4991.
YASIN E, HARUN H S, CHRISTIAN D, et al.. Bilayer Al wire-grids as broadband and high performance polarizers[J]. Optics Express, 2006,14(6): 2323-2334.
SOLAK H,DAVID C,GOBRECHT J, et al.. Fabrication of high-resolution zone plates with wideband extreme-ultraviolet holography[J]. Appl. Phys. Lett., 2004, 85(14): 2700-2702.
HARUN H S, YASIN E, PHILIPP K. Photon-beam lithography reaches 12.5 nm half-pitch resolution [J]. J. Vac. Sci. Technol. B. 2007,25: 91-95.
TEIXEIRA A I,ABRAMS G A,MURPHY C J, et al.. Cell behavior on lithographically defined nanostructured substrates[J]. J. Vac. Sci. Tech. B, 2003, 21(2): 683-68.
高飒飒,卢启鹏,彭忠琦,等. 超高真空精密四刀狭缝的结构原理及有限元分析[J]. 光学精密工程,2013,21(7): 1741-1747. GAO S S,LV Q P,PENG ZH Q,et al.. Principle and finite element analysis on UHV four-knife precision slits [J].Opt. Precision Eng.,2013,21(7):1741-1747.(in Chinese)
赵磊,巩岩,赵阳. 光刻投影物镜中的透镜柔性微动调整机构[J]. 光学精密工程, 2013,21(6):1425-1433. ZHAO L,GONG Y,ZHAO Y.Flexure-based X-Y micro-motion mechanism used in ligthography lens[J].Opt. Precision. Eng.,2013,21(6):1425-1433.(in Chinese)
刘书田,胡瑞,周平,等. 基于筋板式基结构的大口径空间反射镜构型设计的拓扑优化方法[J]. 光学精密工程, 2013,21(7):1803-1810. LIU SH T,HU R,ZHOU P,et al..Topologic optimization for configuration design of web-skin-type ground structure based large-aperture space mirror[J].Opt. Precision Eng.,2013,21(7):1803-1810.(in Chinese)
龚学鹏,卢启鹏,彭忠琦. 软X射线谱学显微光束线单色器结构设计及精度测试[J]. 光学学报,2013,33(2):0234001. GONG X P, LU Q P, PENG Z Q. Structure design and accuracy testing of monochromator in a soft X-ray spectromicroscopic beamline [J]. Acta Optica Sinica, 2013,33(2):0234001.(in Chinese)
吴坤,薛松,卢启鹏,等. SX-700单色器光栅正弦机构转角重复精度的模拟分析与测量[J]. 光学精密工程,2010,18(1): 45-51. WU K, XUE S, LU Q P, et al.. Simulation analysis and measurement of rotation angle repeatability for grating sine mechanism of SX-700 monochromator [J]. Opt. Precision Eng., 2010, 18(1): 45-51.(in Chinese)
卢启鹏,马磊,彭忠琦. 变包含角平面光栅单色器扫描转角精度的检测[J]. 光学精密工程,2010,18(7):1548-1553. LU Q P, MA L, PENG ZH Q. Rotation-angle-accuracy measurement of scanning mechanism in variable included angle plane grating monochromator [J]. Opt. Precision Eng., 2010, 18(7): 1548-1553.(in Chinese)