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Published Online:15 December 1988,
Published:15 December 1988
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李云硕. 真空紫外反射率的测定[J]. 光学精密工程, 1988,(6): 38-43
Li Yunshuo. Measurement of the Vacuum Ultraviolet Reflectivity[J]. Editorial Office of Optics and Precision Engineering, 1988,(6): 38-43
李云硕. 真空紫外反射率的测定[J]. 光学精密工程, 1988,(6): 38-43 DOI:
Li Yunshuo. Measurement of the Vacuum Ultraviolet Reflectivity[J]. Editorial Office of Optics and Precision Engineering, 1988,(6): 38-43 DOI:
研制了一台测定真空紫外反射率的仪器.在真空紫外区可测量各种反射元件在不同入射角下的反射率.用壁稳氩弧光源在100—200um区对Al十MgF
2
薄膜和CVD法制备的SiC镜的反射率进行了测定.并与Al膜的理论反射率曲线做了比较.
A high precision equipment for VUV reflectivity measurement has been developed.It consists of Seya-Namioka concave grating VUV mono- chromator
wall-stabilized aegon are VUV source
capillary discharge VUV source
and high precision VUV reflectometer. The reflectivity of some ssmple
such as mirrors coated with Al
4
-MgF
film and SiC mirrors prepared by CVD method
was investigated at the spectral range from 50nm to 300nm. The comparison between theoritical and experimental results is present.
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