Leak Coefficient Measurement for the Ultra-thin Beryllium Film
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Leak Coefficient Measurement for the Ultra-thin Beryllium Film
Optics and Precision EngineeringVol. 0, Issue 3, Pages: 44-47(1991)
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Published Online:15 June 1991,
Published:15 June 1991
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赵振武. 超薄铍膜漏率的测量[J]. 光学精密工程, 1991,(3): 44-47
Zhao Zhenwu. Leak Coefficient Measurement for the Ultra-thin Beryllium Film[J]. Editorial Office of Optics and Precision Engineering, 1991,(3): 44-47
赵振武. 超薄铍膜漏率的测量[J]. 光学精密工程, 1991,(3): 44-47DOI:
Zhao Zhenwu. Leak Coefficient Measurement for the Ultra-thin Beryllium Film[J]. Editorial Office of Optics and Precision Engineering, 1991,(3): 44-47DOI:
Leak Coefficient Measurement for the Ultra-thin Beryllium Film
This experiment employed mass-spectro-meter comparison method to measure the leak coefficient of ultra-thin beryllium film(d=18μm) of X-ray lithography beam line of Bejing Electron-Positron Colliding Device at a specially designed equipment. To enhance the sensitivity of leak detecting
preset leak detecting method was also introduced. The calculation results show that the leak efficiency is about 10
-5
Pa· m
3
/s. It is consistent with the leak efficiency data of the imported Berylliurn film given by the test sheet.