A Study of Absoulte Measurement of High-Reflectance at 10.6μm

Shao Guiying; Cao Yinhua

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A Study of Absoulte Measurement of High-Reflectance at 10.6μm

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- A Study of Absoulte Measurement of High-Reflectance at 10.6μm
- Optics and Precision Engineering Vol. 0, Issue 6, Pages: 56-61(1992)
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- Published Online：15 December 1992，
  
  Published：15 December 1992
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邵桂英, 曹银花. 10.6微米高反射率绝对测量的研究[J]. 光学精密工程, 1992,(6): 56-61

Shao Guiying, Cao Yinhua. A Study of Absoulte Measurement of High-Reflectance at 10.6μm[J]. Editorial Office of Optics and Precision Engineering, 1992,(6): 56-61
邵桂英, 曹银花. 10.6微米高反射率绝对测量的研究[J]. 光学精密工程, 1992,(6): 56-61 DOI：

Shao Guiying, Cao Yinhua. A Study of Absoulte Measurement of High-Reflectance at 10.6μm[J]. Editorial Office of Optics and Precision Engineering, 1992,(6): 56-61 DOI：

摘要

介绍一种新的红外高反射率绝对测量方法.这是采用双光路和可转动180°的双球镜反射谐振腔光路

测量反射率高次方的光学方法.反射率测量准确度达到5×10

-4

重复精度好于2×10

-4

Abstract

This paper presents a new method of absoulte measurent for infrared high-reflectance.Double beam are used and reflecting cavity of two spherical mirrors are constructed and rotated by 180?.Measuring beam is reflected light times on the surface of sample.The accuracy of measu- rement reflectance is 5?10

-4

and the precision better than 2?10

-4

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