A Linewidth Measuring Instrument with Nanometer Accuracy

Wang Yunqing; Li Qingxiang; Xue Shifu; Zhou Zhaoying

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A Linewidth Measuring Instrument with Nanometer Accuracy

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- A Linewidth Measuring Instrument with Nanometer Accuracy
- Optics and Precision Engineering Vol. 2, Issue 1, Pages: 83-88(1994)
- 作者机构：
  
  清华大学精密仪器系北京,100084
- 作者简介：
- 基金信息：
- DOI：
  CLC：
- Received：01 December 1993，
  
  Published Online：15 February 1994，
  
  Published：15 February 1994
- 稿件说明：
移动端阅览
王云庆, 李庆祥, 薛实福, 周兆英. 纳米级精度的线宽测量仪[J]. 光学精密工程, 1994,(1): 83-88

Wang Yunqing, Li Qingxiang, Xue Shifu, Zhou Zhaoying . A Linewidth Measuring Instrument with Nanometer Accuracy[J]. Editorial Office of Optics and Precision Engineering, 1994,(1): 83-88
王云庆, 李庆祥, 薛实福, 周兆英. 纳米级精度的线宽测量仪[J]. 光学精密工程, 1994,(1): 83-88 DOI：

Wang Yunqing, Li Qingxiang, Xue Shifu, Zhou Zhaoying . A Linewidth Measuring Instrument with Nanometer Accuracy[J]. Editorial Office of Optics and Precision Engineering, 1994,(1): 83-88 DOI：

摘要

在大规模集成电路生产中

对掩膜版与硅片刻线宽度的在线检测是保证质量的重要手段。本文介绍了一种高精度

自动化的线宽测量仪。阐述了其原理

构成及设计中有关问题。经实验表明:该仪器的重复测量精度≤±0.005μm;测量精度为±0.02μm.

Abstract

In LSI production

an important means of guaranteeing quality is to test the linewidthof photomasks and wafers on line

This paper introduces an automatic linewidth measuring instrument with high accuracy

elaborates its principle

constitution and some problems in design. The tests show:its repeatabiiity is up to±0.005μm

accuracy is ±0.02μm.

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Related Author

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Baoxiang ZHANG

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Yu-kui DING

Xun DING

LI Hao

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Related Institution

School of Computer，Electronics and Information，Guangxi University

Guangxi Key Laboratory of Machine Vision and Intelligent Control，Wuzhou University

School of Data Science & Software Engineering，Wuzhou University

Beijing Key Laboratory for Precision Optoelectronic Measurement Instrument and Technology, School of Optoelectronics, Beijing Institute of Technology

Beijing Shengfeifan Electronic System Technology Development Co., Ltd.

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