Soft X-ray Multilayer Fabrication by Magnetron Sputtering

Zhang Junping; Ma Yueying; Gao Honggang; Chen Bin; Pei Shu; Lu Junxia; Cao Jianlin

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Soft X-ray Multilayer Fabrication by Magnetron Sputtering

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- Soft X-ray Multilayer Fabrication by Magnetron Sputtering
- Optics and Precision Engineering Vol. 3, Issue 1, Pages: 16-20(1995)
- 作者机构：
  
  中国科学院长春光学精密机械研究所, 应用光学国家重点实验室, 长春130021
- 作者简介：
- 基金信息：
- DOI：
  CLC：
- Received：17 June 1994，
  
  Published Online：15 February 1995，
  
  Published：15 February 1995
- 稿件说明：
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张俊平, 马月英, 高宏刚, 陈斌, 裴舒, 吕俊霞, 曹健林. 用磁控溅射法制备软X射线多层膜[J]. 光学精密工程, 1995,(1): 16-20

Zhang Junping, Ma Yueying, Gao Honggang, Chen Bin, Pei Shu, Lu Junxia, Cao Jianlin. Soft X-ray Multilayer Fabrication by Magnetron Sputtering[J]. Editorial Office of Optics and Precision Engineering, 1995,(1): 16-20
张俊平, 马月英, 高宏刚, 陈斌, 裴舒, 吕俊霞, 曹健林. 用磁控溅射法制备软X射线多层膜[J]. 光学精密工程, 1995,(1): 16-20 DOI：

Zhang Junping, Ma Yueying, Gao Honggang, Chen Bin, Pei Shu, Lu Junxia, Cao Jianlin. Soft X-ray Multilayer Fabrication by Magnetron Sputtering[J]. Editorial Office of Optics and Precision Engineering, 1995,(1): 16-20 DOI：

摘要

本文介绍用直流-射频平面磁控溅射法制备软x射线多层膜的初步实验结果。在一定工艺条件下

采用计算机定时控制膜厚的方法

严格按照设计周期制备了多层膜样品

并给出了X射线衍射仪小角衍射的检测结果。

Abstract

The preliminary experiment of fabricating soft X-ray multilayer by DC-RF planar mag-netron sputtering is described. Under appropriate working conditions

multilayers can be au-tomatically deposited according to designed period (thickness)using computer controlledtiming method. The results of X-ray small angle diffraction show that the film thickness ac-curacv is about 0.1nm.

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