A deep sub-micron X-ray lithography by using a soft parallel beam X-ray lens

Yan Yiming; Wang Dachun; He Yejun; Yang Cungeng; Zhang Shengji; Liu Andong

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A deep sub-micron X-ray lithography by using a soft parallel beam X-ray lens

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- A deep sub-micron X-ray lithography by using a soft parallel beam X-ray lens
- Optics and Precision Engineering Vol. 3, Issue 4, Pages: 62-65(1995)
- 作者机构：
  
  北京师范大学低能核物理研究所, 北京市辐射中心北京,100875
- 作者简介：
- 基金信息：
- DOI：
  CLC：
- Received：22 June 1995，
  
  Published Online：15 August 1995，
  
  Published：15 August 1995
- 稿件说明：
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颜一鸣, 王大椿, 赫业军, 杨存耿, 张胜基, 刘安东. 使用平行束软X光透镜的深亚微米X射线光刻[J]. 光学精密工程, 1995,(4): 62-65

Yan Yiming, Wang Dachun, He Yejun, Yang Cungeng, Zhang Shengji, Liu Andong. A deep sub-micron X-ray lithography by using a soft parallel beam X-ray lens[J]. Editorial Office of Optics and Precision Engineering, 1995,(4): 62-65
颜一鸣, 王大椿, 赫业军, 杨存耿, 张胜基, 刘安东. 使用平行束软X光透镜的深亚微米X射线光刻[J]. 光学精密工程, 1995,(4): 62-65 DOI：

Yan Yiming, Wang Dachun, He Yejun, Yang Cungeng, Zhang Shengji, Liu Andong. A deep sub-micron X-ray lithography by using a soft parallel beam X-ray lens[J]. Editorial Office of Optics and Precision Engineering, 1995,(4): 62-65 DOI：

摘要

使用本实验室研制的整体平行束软X光透镜作为准直器和电子枪软X光源相配

作成了平行束软X光源

用此平行束软X光源进行了深亚微米X射线光刻实验。刻出了1.0μm～0.2μm的线条。文中对实验装置和光刻结果作了简要的介绍。

Abstract

With combination of a parallel beam soft X-ray lens used as an X-ray beam collimatorand an electron gun soft X-ray generator

a parallel soft X-ray source was developed for deepsubmicron X-ray lithography in the X-ray laboratory of Beijing Normal university.A testinglithography experiment was carried out by using this source and 0.2—1.0μm lines wereobserved.The experimental setup and preliminary resuIts of X-ray lithography is describedbriefly in this report.

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