Soft X-Ray Multilayers at Wavelengths below 10nm

doi:null

您当前的位置：

首页 >

文章列表页 >

Soft X-Ray Multilayers at Wavelengths below 10nm

更新时间：2020-08-12

- Soft X-Ray Multilayers at Wavelengths below 10nm
- Optics and Precision Engineering Vol. 4, Issue 2, Pages: 19-24(1996)
- 作者机构：
  
  中国科学院长春光学精密机械研究所, 应用光学国家重点实验室长春,130022
- 作者简介：
- 基金信息：
- DOI：
  CLC：
- Received：15 August 1995，
  
  Published Online：15 April 1996，
  
  Published：15 April 1996
- 稿件说明：
移动端阅览
吕俊霞, 马月英, 张俊平, 王占山, 曹健林. 工作波长短于10nm的软X射线多层膜[J]. 光学精密工程, 1996,(2): 19-24

Lu Junxia, Ma Yueying Zhang Junping, Wang Zhanshan, Cao Jianlin. Soft X-Ray Multilayers at Wavelengths below 10nm[J]. Editorial Office of Optics and Precision Engineering, 1996,(2): 19-24
吕俊霞, 马月英, 张俊平, 王占山, 曹健林. 工作波长短于10nm的软X射线多层膜[J]. 光学精密工程, 1996,(2): 19-24 DOI：

Lu Junxia, Ma Yueying Zhang Junping, Wang Zhanshan, Cao Jianlin. Soft X-Ray Multilayers at Wavelengths below 10nm[J]. Editorial Office of Optics and Precision Engineering, 1996,(2): 19-24 DOI：

摘要

本文对工作波长短于10nm的软X射线多层膜正入射反射镜的国内外现状作了简单的介绍和分析

给出选择多层膜材料的一些原则

并结合本组情况选择了Ru/B

C、Rh/B

C和MO/B

C三种材料组

在波长8.0nm附近设计并计算出多层膜的结构和反射率等性能参数.

Abstract

This paper introduces the soft X-ray multilayers at wavelengths below 10um andsummaries some rules of selecting the multilayer meterials. We design the Ru/B

C、Rh/B

C and Mo/B

C multilayers for sum wavelength at normal incidence

and give the idealreflectivities of 38%~50%. The effect of thickness control error as well surface-interfaceroughness is also discussed. These will be use fill in next research of fabrication procedure.

关键词

Keywords

references

Views

248

下载量

CSCD

Alert me when the article has been cited

提交

Tools

Publicity Resources

Design and Fabrication of Soft X-ray Double Frequency Grating

13.9 nm Laminar grating as beam splitter

Soft X-ray and extreme ultraviolet optics in CIOMP

Analysis on blaze characteristics of grazing incidence metal grating in soft X-ray region by differential theory with correct Fourier expansion

Experimental study of the spectrum at 11~20 nm of a laser-produced plasma source using water target

Related Author

FU Shao-jun

XU Xiang-dong

QIU Ke-qiang

Liu Ying

LIU Zheng-kun

HONG Yi-lin

TAN Xin

NI Qi-liang

Related Institution

National Synchrotron Radiation Laboratory, University of Science and Technology of China

Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences, Changchun 130033, China

National Synchrotron Radiation Laboratory, University of Science and Technology of China

State Key Laboratory of Applied Optics,Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences, Changchun 130033,China

Graduate School of the Chinese Academy of Sciences, Beijing 100039, China

AI问答

Address：No.3888 Dong Nanhu Road, Changchun, Jilin, China Postal code：130033
Tel：0431-86176855 Email：gxjmgc@ciomp.ac.cn
Technical support is provided by Beijing Founder electronics co., LTD 吉ICP备11002662号-17 京公网安备11010802024621
It is recommended to read the content of this site in Chrome&IE9+. Please switch to extreme mode in browser 360.
Cookies We use cookies to help provide and enhance our service and tailor content. By continuing, you agree to the use of cookies.

⁰