您当前的位置:
首页 >
文章列表页 >
The Influence of Aberration on Measuring Sensitivity in Critical angle Method of Total Reflection for Focus Error Detection
更新时间:2020-08-12
    • The Influence of Aberration on Measuring Sensitivity in Critical angle Method of Total Reflection for Focus Error Detection

    • Optics and Precision Engineering   Vol. 6, Issue 1, Pages: 122-126(1998)
    • Received:09 July 1997

      Published Online:15 February 1998

      Published:15 February 1998

    移动端阅览

  • HOU Shu . The Influence of Aberration on Measuring Sensitivity in Critical angle Method of Total Reflection for Focus Error Detection[J]. Editorial Office of Optics and Precision Engineering, 1998,(1): 122-126 DOI:

  •  
  •  

0

Views

508

下载量

2

CSCD

Alert me when the article has been cited
提交
Tools
Download
Export Citation
Share
Add to favorites
Add to my album

Related Articles

Surface testing with phase diversity method
Elimination of wavefront aberration introduced from large aperture collimator in detection of large optical device
Theory, design, manufacture and measurement of aberration reducing gratings

Related Author

MA Xin-xue
WANG Jian-li
LI Xiang
ZHANG Xiao-hui
ZHU Xiang-bing
FU Shao-jun
YE Wei-quan
HE Shi-ping

Related Institution

Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences
University of Chinese Academy of Sciences
NSRL, University of Science and Technology of China
Department of Physics, Anhui Normal University, Wuhu 241000, China
School of Engineering Science, USTC
0