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Development Conditions of Resist in Soft X-Ray Contact Microscopy
Article | 更新时间:2020-08-12
    • Development Conditions of Resist in Soft X-Ray Contact Microscopy

    • Optics and Precision Engineering   Vol. 5, Issue 5, Pages: 73-77(1997)
    • Received:28 May 1997

      Published Online:15 October 1997

      Published:15 October 1997

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  • Liu Yinan, Wang Zhangshan, Li Zhe, Lin Yiping, Cao Jianlin, Lin Yiping. Development Conditions of Resist in Soft X-Ray Contact Microscopy[J]. Editorial Office of Optics and Precision Engineering, 1997,(5): 73-77 DOI:

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