Study on lon Beam Etching Fabrication for SiO2 Microlens Array

Zhang Xinyu; Yi Xinjian; Zhao Xingrong; Mai Zhihong; He Miao; Li luqin

doi:null

您当前的位置：

首页 >

文章列表页 >

Study on lon Beam Etching Fabrication for SiO₂ Microlens Array

更新时间：2020-08-12

- Study on lon Beam Etching Fabrication for SiO₂ Microlens Array
- Optics and Precision Engineering Vol. 5, Issue 5, Pages: 63-68(1997)
- 作者机构：
  
  1. 航天部二院25所, 北京, 100584
  2. 华中理工大学光电子工程系武汉,430074
- 作者简介：
- 基金信息：
- DOI：
  CLC：
- Received：24 March 1997，
  
  Published Online：15 October 1997，
  
  Published：15 October 1997
- 稿件说明：
移动端阅览
张新宇, 易新建, 赵兴荣, 麦志洪, 何苗, 刘鲁勤. 微透镜阵列的离子束溅射刻蚀研究[J]. 光学精密工程, 1997,(5): 63-68

Zhang Xinyu, Yi Xinjian, Zhao Xingrong, Mai Zhihong, He Miao, Li luqin. Study on lon Beam Etching Fabrication for SiO2 Microlens Array[J]. Editorial Office of Optics and Precision Engineering, 1997,(5): 63-68
张新宇, 易新建, 赵兴荣, 麦志洪, 何苗, 刘鲁勤. 微透镜阵列的离子束溅射刻蚀研究[J]. 光学精密工程, 1997,(5): 63-68 DOI：

Zhang Xinyu, Yi Xinjian, Zhao Xingrong, Mai Zhihong, He Miao, Li luqin. Study on lon Beam Etching Fabrication for SiO2 Microlens Array[J]. Editorial Office of Optics and Precision Engineering, 1997,(5): 63-68 DOI：

摘要

利用扫描电子显微镜(SEM)和表面探针测试

分析了采用离子束溅射刻蚀技术制作的石英微透镜阵列器件的表面微观形貌

讨论了引起微透镜表面缺陷的原因及所采取的改善表面形貌的措施

研究了采用不同层次的光致抗蚀剂微透镜图形的固化技术后

经离子束溅射刻蚀制作出的微透镜阵列器件的表面形貌差异

定性给出了表面探针测试的适用范围

此外还介绍了对所制样品所做的几项主要的处理操作。

Abstract

Using scanning electron microscopy (SEM) and surface style measurement.We have investigated the surface microstructure and morphology of the rectangular arch quartz microlens array fabricated by Ar ion beam etching. The reason induced the surface defect of quartz microlens has been discussed. The methods improving surface microstructure and morphology have been analyzed

The surface morphology differences of the microlens devices fabricated by ion beam etching under the different conditions have been given.In addition

we also introduce several key operations to the quartz samples prepared. The process for preparing quartz microlens has been discussed.

关键词

Keywords

references

Views

961

下载量

CSCD

Alert me when the article has been cited

提交

Tools

Publicity Resources

Rapid fabrication of metallic nanogap structures by shower ion beam etching

Phase mask for fabrication of fiber Bragg gratings by femtosecond laser

Grating polarizers for high power laser systems

Design and fabrication of broadband holographic ion beam etching gratings

Design of diffraction blazed concave grating by partitioned space calculated method

Related Author

ZHENG Mengjie

DUAN Huigao

CHEN Yiqin

SHU Zhiwen

ZENG Pei

Shuang-shuang HUANG

Quan LIU

Jin-chao LU

Related Institution

Ji Hua Laboratory

National Engineering Research Centre for High Efficiency Grinding， College of Mechanical and Vehicle Engineering， Hunan University

School of Optoelectronic Science and Engineering & Collaborative Innovation Center of Suzhou Nano Science and Technology, Soochow University

Key Lab of Advanced Optical Manufacturing Technologies of Jiangsu Province & Key Lab of Modern Optical Technologies of Education Ministry of China, Soochow University

College of Physics, Optoelectronics and Energy & Collaborative Innovation Center of Suzhou Nano Science and Technology, Soochow University

AI问答

Address：No.3888 Dong Nanhu Road, Changchun, Jilin, China Postal code：130033
Tel：0431-86176855 Email：gxjmgc@ciomp.ac.cn
Technical support is provided by Beijing Founder electronics co., LTD 吉ICP备11002662号-17 京公网安备11010802024621
It is recommended to read the content of this site in Chrome&IE9+. Please switch to extreme mode in browser 360.
Cookies We use cookies to help provide and enhance our service and tailor content. By continuing, you agree to the use of cookies.

⁰