Presence and Future Developing Tendency of Ion etching Technology

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- Presence and Future Developing Tendency of Ion etching Technology
- Optics and Precision Engineering Vol. 6, Issue 2, Pages: 7-14(1998)
- 作者机构：
  
  中国科学院长春光学精密机械研究所长春,130022
- 作者简介：
- 基金信息：
- DOI：
  CLC：
- Received：06 October 1997，
  
  Revised：09 January 1998，
  
  Published Online：15 April 1998，
  
  Published：15 April 1998
- 稿件说明：
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任延同. 离子刻蚀技术现状与未来发展[J]. 光学精密工程, 1998,(2): 7-14

REN Yan-Tong . Presence and Future Developing Tendency of Ion etching Technology[J]. Editorial Office of Optics and Precision Engineering, 1998,(2): 7-14
任延同. 离子刻蚀技术现状与未来发展[J]. 光学精密工程, 1998,(2): 7-14 DOI：

REN Yan-Tong . Presence and Future Developing Tendency of Ion etching Technology[J]. Editorial Office of Optics and Precision Engineering, 1998,(2): 7-14 DOI：

目前国内外出现的几种离子刻蚀技术--等离子体刻蚀、反应离子束刻蚀、离子束铣、聚焦离子束刻蚀等分别作了详细介绍

并指出今后离子刻蚀技术的发展方向。

Several ion etching technology are introduced in this paper.They are plasma ion etching

reaction ion etching

ion milling

focusing ion etching.Further developing directionn for the technology is discussed.

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