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Cryogenic Polishing Technology of Monocrystalline Silicon Wafer
更新时间:2020-08-12
    • Cryogenic Polishing Technology of Monocrystalline Silicon Wafer

    • Optics and Precision Engineering   Vol. 6, Issue 5, Pages: 104-109(1998)
    • Received:09 June 1998

      Published Online:15 October 1998

      Published:15 October 1998

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  • HAN Rong-Jiu, SUN Heng-De, XU De-Quan, ZHANG Yun, WANG Li-Jiang. Cryogenic Polishing Technology of Monocrystalline Silicon Wafer[J]. Editorial Office of Optics and Precision Engineering, 1998,(5): 104-109 DOI:

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