New Technology for Fabricating Movable Micromechnical Structures

ZHOU Ming-Bao; CUI Zheng; Prewett D P

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New Technology for Fabricating Movable Micromechnical Structures

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- New Technology for Fabricating Movable Micromechnical Structures
- Optics and Precision Engineering Vol. 6, Issue 5, Pages: 74-78(1998)
- 作者机构：
  
  1. 中国科学院光电技术研究所, 微细加工光学技术国家重点实验室成都,610209
  2. 英国卢瑟福国家实验室微结构中心
- 作者简介：
- 基金信息：
- DOI：
  CLC：
- Received：14 July 1997，
  
  Revised：07 April 1997，
  
  Published Online：15 October 1998，
  
  Published：15 October 1998
- 稿件说明：
移动端阅览
周明宝, 崔铮, Prewett D P,. 用光致抗蚀剂作牺性层材料制作可动微机械[J]. 光学精密工程, 1998,(5): 74-78

ZHOU Ming-Bao, CUI Zheng, Prewett D P. New Technology for Fabricating Movable Micromechnical Structures[J]. Editorial Office of Optics and Precision Engineering, 1998,(5): 74-78
周明宝, 崔铮, Prewett D P,. 用光致抗蚀剂作牺性层材料制作可动微机械[J]. 光学精密工程, 1998,(5): 74-78 DOI：

ZHOU Ming-Bao, CUI Zheng, Prewett D P. New Technology for Fabricating Movable Micromechnical Structures[J]. Editorial Office of Optics and Precision Engineering, 1998,(5): 74-78 DOI：

摘要

报道了用光致抗蚀剂作牺牲层材料制作可动微机械结构的一种新技术。用这种技术制作可动微机械

动件和固定件同时制作。同现有的牺牲层材料相比

光致抗蚀剂作牺牲层材料具有一些优越性。首先

光致抗蚀剂能直接涂敷

能直接光刻成形。此外

用光致抗蚀剂作牺牲层材料不影响结构的厚度和材料的选择。工艺优化后

结构洁净度、固定件与基片的结合强度及牺牲层去除速度都得到了改善。

Abstract

This paper reports a simple process using photoresist as sacrificial layers to fabricate movable microstructures.Movable elements and fixed elements are fabricated simultaneously.The number of required masks is decreased to the least.Comparing with all the existing sacrificial layer materials

the photoresist being used as sacrificial layers has some advantages.The photoresist can be spin coated simply and patterned directly.Otherwise

using photoresist as sacrificial layers does not restrict the thickness of structures and the choice of materials.After some optimization have been taken

the cleanliness of the structures

the adhesion between the fixed elements and the substrate

the speed of the photoresist removal have been improved.

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Related Author

Jin Zhenyu

Related Institution

Changchun Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Changchun, 130022

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