Flowing form of resist forced by centrifugal during process of spin coating used in IC manufacture is analyzed in this paper. Relationship among parameters of rotating speed
viscosity & coated resist thickness have been deduced in the view of liquid dynamics. Measured by practical spin coating and experiment
the changing rule reflected by the theoretical results is coincide well with the measuring data.
Analysis of Effect on Uniformity of Photoresist Layer in Spin Coating
Related Author
REN Yan-Tong
LIU Xiao-han
FENG Xiao-guo
ZHAO Jing-li
GAO Jin-song
ZHANG Hong-sheng
CHENG Zhi-feng
Fu Yongqi
Related Institution
Changchun Institute of Optics and Fine Mechanics, Chinese Academy of Sciences
Key Laboratory of Optical System Advanced Manufacturing Technology, Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences, Changchun 130033, China
Graduate University of Chinese Academy of Sciences, Beijing 100039, China