The Etching Impact on SiO2 Films Resulted in the Alkaline Solution in LCD Process

TANG An-Dong; LIU Jin-Rui; WANG Qiu-Hua; HUANG Yong-Zhuo

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The Etching Impact on SiO₂ Films Resulted in the Alkaline Solution in LCD Process

更新时间：2020-08-12

- The Etching Impact on SiO₂ Films Resulted in the Alkaline Solution in LCD Process
- Optics and Precision Engineering Vol. 7, Issue 3, Pages: 74-78(1999)
- 作者机构：
  
  1. 深圳莱宝真空技术有限公司深圳,518034
  2. 秦皇岛市玻璃厂秦皇岛,066000
  3. 秦皇岛莱成电子有限公司, 秦皇岛066004
- 作者简介：
- 基金信息：
- DOI：
  CLC：
- Received：07 October 1998，
  
  Revised：10 January 1999，
  
  Published Online：15 June 1999，
  
  Published：15 June 1999
- 稿件说明：
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汤安东, 刘金瑞, 王秋花, 黄永卓. LCD工艺中使用的碱性溶液对SiO2膜层的刻蚀作用[J]. 光学精密工程, 1999,(3): 74-78

TANG An-Dong, LIU Jin-Rui, WANG Qiu-Hua, HUANG Yong-Zhuo . The Etching Impact on SiO2 Films Resulted in the Alkaline Solution in LCD Process[J]. Editorial Office of Optics and Precision Engineering, 1999,(3): 74-78
汤安东, 刘金瑞, 王秋花, 黄永卓. LCD工艺中使用的碱性溶液对SiO2膜层的刻蚀作用[J]. 光学精密工程, 1999,(3): 74-78 DOI：

TANG An-Dong, LIU Jin-Rui, WANG Qiu-Hua, HUANG Yong-Zhuo . The Etching Impact on SiO2 Films Resulted in the Alkaline Solution in LCD Process[J]. Editorial Office of Optics and Precision Engineering, 1999,(3): 74-78 DOI：

摘要

钠钙玻璃基片上的SiO

膜层在很大程度上决定了液晶显示器件(LCD)的化学稳定性及使用寿命。本文以射频溅射法制备的SiO

膜层为样品

结合LCD工艺特点

初步研究分析了其工艺流程中所使用的不同碱性溶液对SiO

膜层不同的刻蚀作用。本文的结论有利于在LCD工艺中更好地保护SiO

膜层。

Abstract

The performance of SiO

films coated on the sold-lime glass substrate determine both the chemical stability and the service life of liquid crystal display device (LCD) to a great extent. The authors studied the etching impacts on SiO

films made by radio-frequency sputtering process when the SiO

films are treated in the different alkaline solution in LCD process. The results presented here are profitable to protect the SiO

films in LCD process.

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