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Development of elementary arrangement for soft X-ray projection lithography
更新时间：2020-08-12

    • Development of elementary arrangement for soft X-ray projection lithography

    • Optics and Precision Engineering   Vol. 8, Issue 1, Pages: 66-70(2000)
    • CLC： TN305.7

    • Received：19 August 1999，

      Revised：27 October 1999，

      Published Online：15 February 2000，

      Published：15 February 2000

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  • JIN Chun-shui, WANG Zhan-shan, CAO Jian-lin . Development of elementary arrangement for soft X-ray projection lithography[J]. Editorial Office of Optics and Precision Engineering, 2000,(1): 66-70 DOI：

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