Development of Debris-free Laser Plasma Sources for EUV Lithography in CIOMP

您当前的位置：

首页 >

文章列表页 >

更新时间：2020-08-12

- Development of Debris-free Laser Plasma Sources for EUV Lithography in CIOMP
- Optics and Precision Engineering Vol. 9, Issue 5, Pages: 442-445(2001)
- 作者机构：
  
  State Key Laboratory of Applied Optics, Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences, Changchun, 130022, China
- 作者简介：
- 基金信息：
- DOI：
  CLC： TN305.7
- Received：29 August 2001，
  
  Revised：22 September 2001，
  
  Published Online：15 October 2001，
  
  Published：15 October 2001
- 稿件说明：
移动端阅览
CHEN Bo, NI Qi-liang, CAO Jian-lin . Development of Debris-free Laser Plasma Sources for EUV Lithography in CIOMP[J]. 光学精密工程, 2001,(5): 442-445

CHEN Bo, NI Qi-liang, CAO Jian-lin . Development of Debris-free Laser Plasma Sources for EUV Lithography in CIOMP[J]. Editorial Office of Optics and Precision Engineering, 2001,(5): 442-445
CHEN Bo, NI Qi-liang, CAO Jian-lin . Development of Debris-free Laser Plasma Sources for EUV Lithography in CIOMP[J]. 光学精密工程, 2001,(5): 442-445 DOI：

CHEN Bo, NI Qi-liang, CAO Jian-lin . Development of Debris-free Laser Plasma Sources for EUV Lithography in CIOMP[J]. Editorial Office of Optics and Precision Engineering, 2001,(5): 442-445 DOI：

We have been developing debris-free laser plasma sources for EUV lithography since 1996. Two types of debris-free sources

such as cryogenic target and gas-puff target laser plasma sources

were designed and built up in CIOMP. EUV radiation spectra of the sources with a variety of targets have been obtained by different ways.

We have been developing debris-free laser plasma sources for EUV lithography since 1996. Two types of debris-free sources

such as cryogenic target and gas-puff target laser plasma sources

were designed and built up in CIOMP. EUV radiation spectra of the sources with a variety of targets have been obtained by different ways.

Views

487

下载量

CSCD

Alert me when the article has been cited

提交

Tools

Publicity Resources

Current Status of EUV Lithography

Related Author

Hiroo Kinoshita

Related Institution

Laboratory-of Advanced Science-and Technology-for Industry Himeji Institute-of Technology, 3-1-2 Kouto, Kamigori, Ako-gun, Hyogo 678-1025, Japan

AI问答

Address：No.3888 Dong Nanhu Road, Changchun, Jilin, China Postal code：130033
Tel：0431-86176855 Email：gxjmgc@ciomp.ac.cn
Technical support is provided by Beijing Founder electronics co., LTD 吉ICP备11002662号-17 京公网安备11010802024621
It is recommended to read the content of this site in Chrome&IE9+. Please switch to extreme mode in browser 360.
Cookies We use cookies to help provide and enhance our service and tailor content. By continuing, you agree to the use of cookies.

⁰