Yoshitaka SHITANI, Noboru MIYATA, Mihiro YANAGIHARA, Makoto WATANABE . Thermal Diffusion of Si Atoms at the Interface of Mo/Si Bilayers Studied with a Soft X-ray Emission Microscope[J]. 光学精密工程, 2001,(5): 446-450

Yoshitaka SHITANI, Noboru MIYATA, Mihiro YANAGIHARA, Makoto WATANABE . Thermal Diffusion of Si Atoms at the Interface of Mo/Si Bilayers Studied with a Soft X-ray Emission Microscope[J]. Editorial Office of Optics and Precision Engineering, 2001,(5): 446-450

Yoshitaka SHITANI, Noboru MIYATA, Mihiro YANAGIHARA, Makoto WATANABE . Thermal Diffusion of Si Atoms at the Interface of Mo/Si Bilayers Studied with a Soft X-ray Emission Microscope[J]. 光学精密工程, 2001,(5): 446-450 DOI：

Yoshitaka SHITANI, Noboru MIYATA, Mihiro YANAGIHARA, Makoto WATANABE . Thermal Diffusion of Si Atoms at the Interface of Mo/Si Bilayers Studied with a Soft X-ray Emission Microscope[J]. Editorial Office of Optics and Precision Engineering, 2001,(5): 446-450 DOI：