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Research Center for Soft X-ray Microscopy, Institute of Multidisciplinary Research for Advanced Materials, Tohoku University, Japan
Received:29 August 2001,
Revised:08 October 2001,
Published Online:15 October 2001,
Published:15 October 2001
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Masaki Yamamoto, Tadashi Hatano, Minaji Furudate. Present Status of EUV Interferometer Development at the Research Center for Soft X-ray Microscopy[J]. 光学精密工程, 2001,(5): 405-410
Masaki Yamamoto, Tadashi Hatano, Minaji Furudate. Present Status of EUV Interferometer Development at the Research Center for Soft X-ray Microscopy[J]. Editorial Office of Optics and Precision Engineering, 2001,(5): 405-410
Masaki Yamamoto, Tadashi Hatano, Minaji Furudate. Present Status of EUV Interferometer Development at the Research Center for Soft X-ray Microscopy[J]. 光学精密工程, 2001,(5): 405-410 DOI:
Masaki Yamamoto, Tadashi Hatano, Minaji Furudate. Present Status of EUV Interferometer Development at the Research Center for Soft X-ray Microscopy[J]. Editorial Office of Optics and Precision Engineering, 2001,(5): 405-410 DOI:
A new interferometer for extreme ultraviolet (EUV) radiation with a laser produced plasma (LPP) laboratory source is under construction. The LPP source is operated with a Sn solid rod target on which pulsed YAG laser is focused to produce high temperature plasma emitting EUV radiation. The source is equipped with a newly designed debris stopper protecting a condenser multilayer mirror from the particle debris of the target. The condenser mirror focuses the light onto an EUV beam-splitter to form transmitted and reflected paths for producing interference fringes of a sharing type. The optical configuration is of a common path based on a triangular path type with a focusing at the beam-splitter
which is enabled to produce fringes by a low coherence radiation with a standard optical quality beam-splitter. The fringes are recorded by an imaging plate with pixels as small as 25μm. The dynamic range of linearity in detection of the EUV light was found to be more than 10
4
with sensitivity of 10
4
photons/pixel
enough for the purpose of interferogram recording
possibly with one laser shot.
A new interferometer for extreme ultraviolet (EUV) radiation with a laser produced plasma (LPP) laboratory source is under construction. The LPP source is operated with a Sn solid rod target on which pulsed YAG laser is focused to produce high temperature plasma emitting EUV radiation. The source is equipped with a newly designed debris stopper protecting a condenser multilayer mirror from the particle debris of the target. The condenser mirror focuses the light onto an EUV beam-splitter to form transmitted and reflected paths for producing interference fringes of a sharing type. The optical configuration is of a common path based on a triangular path type with a focusing at the beam-splitter
which is enabled to produce fringes by a low coherence radiation with a standard optical quality beam-splitter. The fringes are recorded by an imaging plate with pixels as small as 25μm. The dynamic range of linearity in detection of the EUV light was found to be more than 10
4
with sensitivity of 10
4
photons/pixel
enough for the purpose of interferogram recording
possibly with one laser shot.
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