Using metastable argon atomic beam to fabricate nanostructures

CHEN Xian-zhong; GAO Hong-tao; YAO Han-min; CHEN Xu-nan; LI Zhan; SHI Jian-ping; CHEN Yuan

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Using metastable argon atomic beam to fabricate nanostructures

更新时间：2020-08-12

- Using metastable argon atomic beam to fabricate nanostructures
- Optics and Precision Engineering Vol. 11, Issue 1, Pages: 6-10(2003)
- 作者机构：
  
  中国科学院光电技术研究所, 微细加工光学技术国家重点实验室,四川成都,610209
- 作者简介：
- 基金信息：
- DOI：
  CLC： TN305.7
- Received：17 October 2002，
  
  Revised：25 December 2002，
  
  Published Online：15 February 2003，
  
  Published：15 February 2003
- 稿件说明：
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陈献忠, 高洪涛, 姚汉民, 陈旭南, 李展, 石建平, 陈元培. 用亚稳态氩原子束制作纳米结构[J]. 光学精密工程, 2003,(1): 6-10

CHEN Xian-zhong, GAO Hong-tao, YAO Han-min, CHEN Xu-nan, LI Zhan, SHI Jian-ping, CHEN Yuan-pei. Using metastable argon atomic beam to fabricate nanostructures[J]. Editorial Office of Optics and Precision Engineering, 2003,(1): 6-10
陈献忠, 高洪涛, 姚汉民, 陈旭南, 李展, 石建平, 陈元培. 用亚稳态氩原子束制作纳米结构[J]. 光学精密工程, 2003,(1): 6-10 DOI：

CHEN Xian-zhong, GAO Hong-tao, YAO Han-min, CHEN Xu-nan, LI Zhan, SHI Jian-ping, CHEN Yuan-pei. Using metastable argon atomic beam to fabricate nanostructures[J]. Editorial Office of Optics and Precision Engineering, 2003,(1): 6-10 DOI：

摘要

纳米结构制作是纳米技术的重要组成部分

原子光刻技术是纳米图形制作的一项新方法.对直流高压放电产生的亚稳态氩原子束进行准直减小其发散角

亚稳态原子在与之传播方向垂直的激光驻波场中发生淬火并沉积在基底上

破坏吸附在基底表面的SAM膜(self_assembled monolayers)

结合刻蚀技术可制作出纳米量级的图形.给出该技术制作纳米图形的基本原理、方案、相关理论及模拟结果.

Abstract

Fabrication of nanostructures is an important part of nanotechnology

and atom li thography technology is a new nanostructure fabrication method. A me tastable a rgon atomic beam generated by high-voltage discharge is collimated to minimize t he divergence angle of atomic beam.Metastable atoms are quenched when well-c ollimated beam travels through the light standing wave perpendicular to the prop agation direction of the atomic beam

and then deposited onto the substrate. SAM abso rbed on substrate surface is damaged by metastable atoms

and the nanometer-scale structure can be fabricated with etching technologies. The basic principle

expe rimental schemes

correlative theory of this technique and simulation results are given.

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Keywords

references

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JOHNSON K S,BERGGREN K K,BLACK A,et al.Using neutral metastable argon atoms and contamination lithography to form nanostructure in silicon,silicon dioxide,and gold[J]. J Appl Phys Lett,1996,69(18):2773-2775.

CHU A P,JOHNSON K S,PRENTISS M G. Avirtual amplitude grating for aomic optics[J].Opt Commun,1997,134:105-111.

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罗先刚.原子光刻技术探索研究[D].成都:中国科学院光电技术研究所,2001.LUO X G. Study on atom lighography, doctoral dissertation[D]. Chengdu:Institute of Optics and Electronics, Chinese Academy of Sciences. Chengdu,2001.(in Chinese)

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