WANG De-qiang, XIE Chang-qing, YE Tian-chun. Image edge-enhanced technique for X-ray lithography alignment[J]. Editorial Office of Optics and Precision Engineering, 2004,(4): 426-431
WANG De-qiang, XIE Chang-qing, YE Tian-chun. Image edge-enhanced technique for X-ray lithography alignment[J]. Editorial Office of Optics and Precision Engineering, 2004,(4): 426-431DOI:
Image edge-enhanced technique for X-ray lithography alignment
The image edge-enhanced technique was proposed to improve the automatic aligning efficiency and aligning accuracy in the X-ray lithography aligning system
and the numerical analysis was given. After analyzing individuals
and the whole view of the image edge-enhanced techniques was given
the novel method were presented. The image obtained from the CCD image system is processed with three image edge-enhanced methods
which are SOBEL operator
LAPLAC operator and convolution. Then the processed results of the novel methods were compared with each other. The conclusion is that the best method is LAPLAC operator and convolution work together
first convolution
then using LAPLAC operator. With this method automatic aligning efficiency can be improved by about 50% in aligning system. Comparing with 20 minutes for the original method
the automatic aligning time only needs 10 minutes or so with novel method
and the aligning accuracy can be improved from 0.10 microns to 0.08 microns.
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references
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