Technology for measuring spectrum from nanosecond laser plasma soft X-ray source

NI Qi-liang

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Technology for measuring spectrum from nanosecond laser plasma soft X-ray source

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- Technology for measuring spectrum from nanosecond laser plasma soft X-ray source
- Optics and Precision Engineering Vol. 13, Issue 2, Pages: 211-218(2005)
- 作者机构：
  
  中国科学院长春光学精密机械与物理研究所应用光学国家重点实验室,吉林长春 130033
- 作者简介：
- 基金信息：
- DOI：
  CLC： O536
- Received：10 February 2005，
  
  Revised：06 March 2005，
  
  Published Online：30 April 2005，
  
  Published：30 April 2005
- 稿件说明：
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NI Qi-liang. Technology for measuring spectrum from nanosecond laser plasma soft X-ray source[J]. Optics and precision engineering, 2005, 13(2): 211-218.
DOI：

NI Qi-liang. Technology for measuring spectrum from nanosecond laser plasma soft X-ray source[J]. Optics and precision engineering, 2005, 13(2): 211-218. DOI：

摘要

提出了一种新的探测和测量激光等离子体软X射线源光谱强度的方法。此方法使用通道电子倍增器和定标过的硅光电二极管为探测器

前者是非标准探测器

后者为标准探测器。应用电荷灵敏前置放大器和峰值探测器测量探测器产生的电量

并以高分辨率的光谱仪为分光元件

在已知光栅效率、通道电子倍增器增益、硅光电二极管能量响应的条件下

给出了计算激光等离子体软X射线源在某一波长光谱强度的公式。

Abstract

A method detecting and measuring the intensity of spectrum from laser plasma soft X-ray source is presented. A channel electron multiplier (CEM) and a calibrated silicon photodiode are used as detectors in this method

the former is a nonstandard detector and the latter is a standard one. Charge-sensitive preamplifiers and peak detector are used for measuring total charges generated by detectors

and a monochromator with high resolution is employed as spectrometer

formulae to calculate the intensity of spectrum from laser plasma soft x-ray source is given

based on known the grating efficiency of monochromator

CEM's gain and responsivity of silicon photodiode to photons.

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Keywords

references

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