Experimental study of the resolution of an optoelectronic imaging system at 17.1 nm based on MCP detector
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Experimental study of the resolution of an optoelectronic imaging system at 17.1 nm based on MCP detector
Optics and Precision EngineeringVol. 13, Issue 2, Pages: 225-230(2005)
作者机构:
1. 中国科学院 长春光学精密机械与物理研究所 应用光学国家重点实验室,吉林 长春 130033
2. 长春理工大学 理学院,吉林 长春 130022
作者简介:
基金信息:
DOI:
CLC:TP751
Received:15 December 2004,
Revised:08 January 2005,
Published Online:30 April 2005,
Published:30 April 2005
稿件说明:
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XUE Ling-ling, CHEN Bo, NI Qi-liang, et al. Experimental study of the resolution of an optoelectronic imaging system at 17.1 nm based on MCP detector[J]. Optics and precision engineering, 2005, 13(2): 225-230.
DOI:
XUE Ling-ling, CHEN Bo, NI Qi-liang, et al. Experimental study of the resolution of an optoelectronic imaging system at 17.1 nm based on MCP detector[J]. Optics and precision engineering, 2005, 13(2): 225-230.DOI:
Experimental study of the resolution of an optoelectronic imaging system at 17.1 nm based on MCP detector
An optoelectronic imaging system was designed to image EUV light at 17.1 nm. This imaging system is composed of three parts: light source
monochromator and detection system. A Q-modulated Nd-YAG laser (Continuum 9000) is used to produce laser plasma. The grazing monochromator consists of two spherical mirrors and a spherical grazing grating
by which monochromatic light at 17.1 nm is obtained and the detector is a MCP(Microchannel Plate) and phosphor screen assembly. Kodak 400 film is used to record the image of a 3 mm-width-slit obtained by this imaging system. Its spatial resolution of 130 μm is demonstrated in this paper
which is better than that of reference [6].
关键词
Keywords
references
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Research progress of normal-incidence optical system at extreme ultraviolet (EUV) wavelength
Nanosecond extreme ultraviolet radiation damage on thin film mirrors
Ultra-precision machining and testing of reflector mirrors for extreme ultraviolet and X-ray
Design and fabrication of EUV broadband multilayer mirrors with discrete thicknesses
Spectral calibration of medical microscopic imaging spectrometer
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Related Institution
Institute of Precision Optical Engineering, MOE Key Laboratory of Advanced Micro-Structured Materials, Shanghai Frontiers Science Center of Digital Optics, Shanghai Professional Technical Service Platform for Full-Spectrum and High-Performance Optical Thin Film Devices and Applications, School of Physics Science and Engineering, Tongji University
Institute of Precision Optical Engineering, MOE Key Laboratory of Advanced Micro-Structured Materials, Shanghai Frontiers Science Center of Digital Optics, Shanghai Professional Technical Service Platform for Full-Spectrum and High-Performance Optical Thin Film Devices and Applications, School of Physics Science and Engineering, Tongji University
Sino-German College of Applied Sciences, Tongji University
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