Optical broadband monitoring of thin film growth

H. Ehlers; T. Groβ; M. Lappschies; D. Ristau

doi:null

您当前的位置：

首页 >

文章列表页 >

Optical broadband monitoring of thin film growth

更新时间：2020-08-12

- Optical broadband monitoring of thin film growth
- Optics and Precision Engineering Vol. 13, Issue 4, Pages: 403-412(2005)
- 作者机构：
  
  Laser Zentrum Hannover, Hollerithallee 8, 30419 Hannover, Germany
- 作者简介：
- 基金信息：
- DOI：
  CLC：
- Received：06 June 2005，
  
  Revised：16 June 2005，
  
  Published Online：30 August 2005，
  
  Published：30 August 2005
- 稿件说明：
移动端阅览
H. Ehlers, T. Groβ, M. Lappschies, et al. Optical broadband monitoring of thin film growth[J]. Optics and precision engineering, 2005, 13(4): 403-412.
DOI：

H. Ehlers, T. Groβ, M. Lappschies, et al. Optical broadband monitoring of thin film growth[J]. Optics and precision engineering, 2005, 13(4): 403-412. DOI：

摘要

This contribution is focused on applications of spectroscopic methods for the precise control of deposition processes. In this context

the present study gives a review on selected combinations of conventional and ion deposition techniques with different broadband online spectrophotometric systems. Besides two systems operating in the VIS- and NIR-spectral range in combination with ion processes

also a monochromator system developed for conventional deposition processes in the DUV/VUV-spectral range will be discussed. The considerations will be concluded by a comparison of the major advantages of the specific combinations of processes with online monitoring concepts and by a brief outlook concerning future challenges.

Abstract

This contribution is focused on applications of spectroscopic methods for the precise control of deposition processes. In this context

关键词

Keywords

references

. B. Vidal, A. Fornier,E. Pelletier.Optical monitoring of nonquarterwave multilayer filters[J]. Appl. Opt.,1978,17(7):1038.

. B. Vidal, A. Fornier,E. Pelletier. Wideband optical monitoring of nonquarterwave multilayer filters[J]. Appl. Opt.,1979,18:3851.

. I. Powell, J.C.M. Zwinkels, et.al. Development of optical monitor for control of thin-film deposition[J]. Appl. Opt.,1986,3645:25.

. F.J. van Milligen, H.A. Macleod. Development of an automated scanning monochromator for monitoring thin films[J]. Appl. Opt.,1985,24(12):1799-1802.

. R.P. Netterfield, P.J. Martin, K.H. Müller, In-situ optical monitoring of thin film deposition[J]. SPIE,1988,1012:10-15.

. G. Emiliani, A. Piegari, E. Masetti. Fast scan spectrometer for monitoring of thin film optical properties[J].SPIE,1988,1012:35.

. H.H. Bauer, E. Nüssler. In-situ optical multichannel spectrometer system[J].SPIE,1994,2253:423.

. M. Tilsch, V. Scheuer, J. Staub, T. Tschudi. Direct optical monitoring instrument with double detection system for the control of multilayer systems from the visible to the near infrared[J]. SPIE,1994,2253:414-422.

. B.T. Sullivan,J.A. Dobrowolski. Deposition error compensation for optical multilayer coatings:II. Experimental results-sputtering system[J]. Appl. Opt.,1993,32:2351.

. K. Starke, T. GroB, D. Ristau. Rapid prototyping of optical thin film filters[J]. Conference Optical and Infrared Thin Films., SPIE,2000,4094:83-92.

. M. Lappschies, T. GroB, H. Ehlers, D. Ristau. Broadband optical monitoring for the deposition of complex coatings . Proceedings of the Conference on "Advances in Optical Thin Films", St. Etienne, France, SPIE,2004,5250:519-527.

. St. Günster, P. Kadkhoda, D. Ristau, Online spectrophotometric characterisation of MgF2/LaF3-fluoride multilayer coatings production .Proceedings of the Conference of on Optical Interference Coatings, OSA Technical Digest pp. ME9-1-ME9-3, 2001

. D. Ristau,St. Günster, Optimization of optical coatings for the UV/VUV-range . Proceedings of the Conference on "Advanced Characterization Techniques for Optics, Semiconductors, and Nanotechnologies", San Diego, USA, SPIE,2003,5188:80-95.

. J.A. Dobrowolski. Publications in proceedings of the conference of on optical interference coatings . OSA Technical Digest,1995, 1998, 2001, 2004.

. M. Lappschies, B. G rtz, D. Ristau. Application of optical broadband monitoring to quasi-rugate filters by ion beam sputtering . Proceedings of the Conference of on Optical Interference Coatings, OSA Technical Digest pp.TuE4, June 29th,2004.

. H. Ehlers, T. GroB, M. Lappschies, D. Ristau. Ion assisted deposition processes for precision and laser optics . Proceedings of the Conference on "Advances in Optical Thin Films", St. Etienne, France, SPIE,2004,5250:519-527.

. J. Freisinger, H.W. L b, A. Scharmann. Rf-ion beam source RIM-10 for material processing . Kerntechnik,1987,51:125-128.

. M. Dieckmann, Spektrum: Thin Film Design Software[Z]. 1990-2005

. Product of Leybold Optics GmbH, Alzenau, Germany[Z].

Views

455

下载量

CSCD

Alert me when the article has been cited

提交

Tools

Publicity Resources

Weak absorption test and defect analysis of optical coatings

Standardization in optical coating characterisation

Optical coating and nano-structuring on plastics

Infrared optical coatings in SITP

Optical coatings:trends and challenges

Related Author

FAN Zheng-xiu

SHAO Jian-da

ZHAO Yuan-an

FAN Shu-hai

LI Xia

HE Hong-bo

U. Schulz

N. Kaiser

Related Institution

Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences

Laser Zentrum Hannover

Fraunhofer Institut für Angewandte Optik und Feinmechnik Albert-Einstein-Str. 7,- Jena

Shanghai Institute of Technical Physics, Chinese Academy of Sciences

Fraunhofer Institut für Angewandte Optik und Feinmechanik, Albert-Einstein-Str. 7,- Jena

AI问答

Address：No.3888 Dong Nanhu Road, Changchun, Jilin, China Postal code：130033
Tel：0431-86176855 Email：gxjmgc@ciomp.ac.cn
Technical support is provided by Beijing Founder electronics co., LTD 吉ICP备11002662号-17 京公网安备11010802024621
It is recommended to read the content of this site in Chrome&IE9+. Please switch to extreme mode in browser 360.
Cookies We use cookies to help provide and enhance our service and tailor content. By continuing, you agree to the use of cookies.

⁰