Research of multilayers in EUV;soft X-ray and X-ray

WANG Zhan-shan; WANG Feng-li; ZHANG Zhong; WANG Hong-chang; WU Wen-juan; ZHANG Shu-min; XU

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Research of multilayers in EUV;soft X-ray and X-ray

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- Research of multilayers in EUV;soft X-ray and X-ray
- Optics and Precision Engineering Vol. 13, Issue 4, Pages: 512-518(2005)
- 作者机构：
  
  Institute of Precision Optical Engineering, Department of Physics, Tongji University Shanghai,China,200092
- 作者简介：
- 基金信息：
- DOI：
  CLC：
- Received：06 June 2005，
  
  Revised：16 June 2005，
  
  Published Online：30 August 2005，
  
  Published：30 August 2005
- 稿件说明：
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WANG Zhan-shan, WANG Feng-li, ZHANG Zhong, et al. Research of multilayers in EUV;soft X-ray and X-ray[J]. Optics and precision engineering, 2005, 13(4): 512-518.
DOI：

WANG Zhan-shan, WANG Feng-li, ZHANG Zhong, et al. Research of multilayers in EUV;soft X-ray and X-ray[J]. Optics and precision engineering, 2005, 13(4): 512-518. DOI：

摘要

To develop beam splitters for soft X-ray laser Michelson interferometer at 13.9 nm

Mo/Si multilayers of 100 nm thickness deposited on both sides of silicon nitride were fabricated by using DC magnetron sputtering. Initial evaluation of their reflectivity and transmission showed that reflectivity and transmission were above 10% and 25%. The broadband analyzers have been designed

fabricated and characterized for 13~20 nm polarization measurements. The measured results are in good agreement with the design. The supermirrors with different angular intervals at 0.154 nm have been designed

fabricated and characterized.

Abstract

To develop beam splitters for soft X-ray laser Michelson interferometer at 13.9 nm

fabricated and characterized.

关键词

Keywords

references

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