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Spacing device with 700° slewing area for large photoelectric instrumentation
更新时间:2020-08-12
    • Spacing device with 700° slewing area for large photoelectric instrumentation

    • Optics and Precision Engineering   Vol. 14, Issue 3, Pages: 412-415(2006)
    • CLC: TH74
    • Received:14 January 2005

      Revised:20 February 2005

      Published Online:30 June 2006

      Published:30 June 2006

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  • GAO Yun-guo, ZHAO Guo-jie, HAN Guang-yu. Spacing device with 700° slewing area for large photoelectric instrumentation[J]. Optics and precision engineering, 2006, 14(3): 412-415. DOI:

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Related Author

GAO Yun-guo
TANG Guo-dong
HAN Guang-yu
LIU Xing-fa
MA Jia-guang
XIAO Ying
JIN Long-xu
LI Wen-jun

Related Institution

Graduate School of the Chinese Academy of Sciences
Institute of Optics and Electronics, Chinese Academy of Sciences
Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences, Changchun 130033, China
Graduate School of the Chinese Academy of Sciences
Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences
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