Xenon is a promising target material in Extreme Ultraviolet Lithography(EUVL) for its high EUV intensity in 13~14 nm and no condensation on multilayer mirror surfaces due to chemical inert

and therefore a Laser Produced Plasms (LPP) source with liquid aerosol spray target is designed and developed in this paper. The spectral radiation characteristics

laser-to-EUV conversion efficiency at 13.4 nm and debris production by target material erosion or deposition of the liquid Xe aerosol spray target are studied in detail. Experimental results show that the maximum conversion efficiencey of Xe is 0.75%/2π sr/2%bw at 13.4 nm

and pulse-pulse sability is ±4%(1σ) at 0.5 mm laser-nozzle diatance

the results also show that liquid Xe aerosol spray target LPP source can almost eliminate debris after 10

5

laser shots.