Optimization of solidification process parameters in micro stereo lithography
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Optimization of solidification process parameters in micro stereo lithography
Optics and Precision EngineeringVol. 15, Issue 4, Pages: 453-459(2007)
作者机构:
中国科学技术大学 精密机械与精密仪器系,安徽 合肥 230026
作者简介:
基金信息:
DOI:
CLC:TN305.7
Received:23 June 2006,
Revised:25 August 2006,
Published Online:30 April 2007,
Published:30 April 2007
稿件说明:
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WANG Xiang, ZHAO Gang, MA De-sheng, et al. Optimization of solidification process parameters in micro stereo lithography[J]. Optics and precision engineering, 2007, 15(4): 453-459.
DOI:
WANG Xiang, ZHAO Gang, MA De-sheng, et al. Optimization of solidification process parameters in micro stereo lithography[J]. Optics and precision engineering, 2007, 15(4): 453-459.DOI:
Optimization of solidification process parameters in micro stereo lithography
For analysis on the effect of process parameters on the shape and precision of solidification in photosensitive resin solidification with UV light exposing
the main solidification process parameters are analyzed and optimized based on the experiment data got by self-made equipment. The high precision solidified line is abtained in the thickness of a single layer of liquid resin of 30 μm
the exposing power of 0.15 μW
the scanning speed of 15 μm/s and the working length between objective lens and surface of resin of 650 μm. With the optimized process parameters
3D micro structures are manufactured successfully.