Optical properties and material growth of GaAs(110) quantum wells
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Optical properties and material growth of GaAs(110) quantum wells
Optics and Precision EngineeringVol. 15, Issue 5, Pages: 678-683(2007)
作者机构:
1. 兰州大学 物理科学与技术学院,甘肃 兰州,730000
2. 中国科学院 物理研究所 凝聚态国家实验室 北京,100080
3. 东南大学 MEMS教育部重点实验室,江苏 南京,210096
作者简介:
基金信息:
DOI:
CLC:TN304.23
Received:25 January 2007,
Revised:18 March 2007,
Published Online:30 May 2007,
Published:30 May 2007
稿件说明:
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LIU Lin-sheng, LIU Su, WANG Wen-xin, et al. Optical properties and material growth of GaAs(110) quantum wells[J]. Optics and precision engineering, 2007, 15(5): 678-683.
DOI:
LIU Lin-sheng, LIU Su, WANG Wen-xin, et al. Optical properties and material growth of GaAs(110) quantum wells[J]. Optics and precision engineering, 2007, 15(5): 678-683.DOI:
Optical properties and material growth of GaAs(110) quantum wells
There are two growth modes (monolayer-by-monolayer and bilayer-by-bilayer) under different conditions that correspond to monolayer and bilayer RHEED (Reflection High Energy Electron Diffraction) oscillations when GaAs epitaxial layer grows on GaAs (110) substrate. TEM (Transmission Electron Microscope) and photoluminescence measurements at room temperature and low temperature show that the quantum wells have very bad optical property under bilayer-by-bilayer growth mode and have nice optical property and rough interfaces under monolayer-by-monolayer growth mode. The results show that using different RHEED oscillations under different growth conditions
it is possible to grow high quality quantum wells on GaAs(110) surface.