A simple and low-cost method to fabricate implantable flexible thin-film microelectrodes is described for neural applications. A photosensitive polyimide (Durimide 7510) is used as substrate materials instead of non-photosensitive polyimide or parylene in conventional process. A new self-shaped technique for thin-film electrode is also employed in the scheme. In addition

an easy and mild release procedure based electrochemical etch is proposed to detach microelectrodes from the fabrication substrate. The whole process using only two masks and two depositions is simple and fast

and can greatly reduce the time and cost of fabrication of neural microelectrodes. The geometrical

electrical properties and biocompatibility of the microelectrodes are also discussed.