Evaluation of efficiency for silicon wafer cleaning by image processing
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Evaluation of efficiency for silicon wafer cleaning by image processing
Optics and Precision EngineeringVol. 15, Issue 8, Pages: 1263-1268(2007)
作者机构:
大连理工大学 精密与特种加工教育部重点实验室,辽宁 大连,116023
作者简介:
基金信息:
DOI:
CLC:TG665;TP391.4
Received:06 February 2007,
Revised:29 May 2007,
Published Online:30 August 2007,
Published:30 August 2007
稿件说明:
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WANG Xu-yue, XU Wei-xing, SI Ma-yuan, et al. Evaluation of efficiency for silicon wafer cleaning by image processing[J]. Optics and precision engineering, 2007, 15(8): 1263-1268.
DOI:
WANG Xu-yue, XU Wei-xing, SI Ma-yuan, et al. Evaluation of efficiency for silicon wafer cleaning by image processing[J]. Optics and precision engineering, 2007, 15(8): 1263-1268.DOI:
Evaluation of efficiency for silicon wafer cleaning by image processing
Based on Image Processing Toolbox of Matlab technique
a new evaluation method of cleaning efficiency is presented in dry laser cleaning particles of silicon wafer surface. Image Processing Toolbox of Matlab is used to recognize optical information of silicon wafer surface before and after laser cleaning and the evaluating programs are developed to count the number of pollution particles on the silicon wafer and to evaluate the cleaning efficiency. The results show that the statistical accuracy of the method is 97.6%
and the laser cleaning accurate reaches 99.2%. The research achievement offers a effective