Design of VUV beamline for ARPES studies at SSRF

MA De-wei; QIAO Shan; ZHANG Xin-yi; FENG Dong-lai

doi:null

您当前的位置：

首页 >

文章列表页 >

Design of VUV beamline for ARPES studies at SSRF

Article | 更新时间：2020-08-12

- Design of VUV beamline for ARPES studies at SSRF
- Optics and Precision Engineering Vol. 15, Issue 12, Pages: 1844-1849(2007)
- 作者机构：
  
  复旦大学物理系应用表面物理国家重点实验室上海,200433
- 作者简介：
- 基金信息：
- DOI：
  CLC： TH838.3;O657.62
- Received：20 August 2007，
  
  Revised：10 October 2007，
  
  Published Online：30 December 2007，
  
  Published：30 December 2007
- 稿件说明：
移动端阅览
马德伟,乔山,张新夷,封东来. 上海光源真空紫外角分辨光电子能谱束线设计[J]. 光学精密工程, 2007,15(12):1844-1849

MA De-wei, QIAO Shan, ZHANG Xin-yi, et al. Design of VUV beamline for ARPES studies at SSRF[J]. Optics and precision engineering, 2007, 15(12): 1844-1849.
马德伟,乔山,张新夷,封东来. 上海光源真空紫外角分辨光电子能谱束线设计[J]. 光学精密工程, 2007,15(12):1844-1849 DOI：

MA De-wei, QIAO Shan, ZHANG Xin-yi, et al. Design of VUV beamline for ARPES studies at SSRF[J]. Optics and precision engineering, 2007, 15(12): 1844-1849. DOI：

摘要

在上海光源上设计了一条光子能量覆盖5~140 eV的高通量、高分辨的真空紫外角分辨光电子能谱束线。本光束线采用准周期椭圆偏振波荡器光源

其周期长度为0.32 m

周期数为14。单色仪采用Dragon型

分为覆盖5~32 eV的低能分支和25~140 eV的高能分支。计算表明

当入射/出射狭缝开启宽度为5/5 μm时

在整个能量扫描范围内

单色仪分辨率可以高达15 000~100 000

光学元件的面型误差对分辨率的影响最大。通量计算显示

样品处s偏振光子通量高达~10

phs/s。Shadow追迹模拟结果表明

设计的光束线具有很好的聚焦特性。

Abstract

Vacuum ultraviolet (VUV) beamlines have been playing an important role in studying the electronic structure of solids. Until now

over 30 VUV beamlines for Angle-resolved Photoemission Spectroscopy (ARPES) studies have been built in the synchrotron radiation facilities of US

Japan and Europe. In this work

we present a design of a high-resolution and high-flux VUV beamline covering 5~140 eV photon energy range at Shanghai Synchrotron Radiation Facility(SSRF) for ARPES studies. A quasi-periodic Elliptical Polarized Undulator (EPU) with 14 periods and each 0.32 m long is used as the source. A Dragon-type monochromator with two branches

a lower energy branch covering 5~32 eV and a higher one covering 25~140 eV

is employed. Calculations show that the total resolutions of the monochromator can reach up to 15 000~100 000 with entrance/exit slit openings of 5/5 μm and the ultimate flux of the s-polarized photon on a sample exceeds ~10

phs/s. The figure slope errors dominate the total resolution limit of the monochromator. Ray-tracing simulations show that the designed beamline has a good focusing performance. This beamline will be the first VUV beamline constructed at SSRF and will provide valuable experience for future constructions.

关键词

Keywords

references

Views

408

下载量

CSCD

Alert me when the article has been cited

提交

Tools

Publicity Resources

High Resolution Grazing Incidence Soft X-ray and VUV Monochromator

Related Author

LU Qi-Peng

Related Institution

Changchun Institute of Optics and Fine Mechanics, Chinese Academy of Sciences

AI问答

Address：No.3888 Dong Nanhu Road, Changchun, Jilin, China Postal code：130033
Tel：0431-86176855 Email：gxjmgc@ciomp.ac.cn
Technical support is provided by Beijing Founder electronics co., LTD 吉ICP备11002662号-17 京公网安备11010802024621
It is recommended to read the content of this site in Chrome&IE9+. Please switch to extreme mode in browser 360.
Cookies We use cookies to help provide and enhance our service and tailor content. By continuing, you agree to the use of cookies.

⁰