Mark image geometric distortion calibration in alignment system for multilevel imprint lithography

WANG Quan-dai; DUAN Yu-gang; DING Yu-cheng; GUAN Hong-wu; LU Bing-heng

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Mark image geometric distortion calibration in alignment system for multilevel imprint lithography

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- Mark image geometric distortion calibration in alignment system for multilevel imprint lithography
- Optics and Precision Engineering Vol. 15, Issue 3, Pages: 422-427(2007)
- 作者机构：
  
  西安交通大学机械制造系统工程国家重点实验室,陕西西安,710049
- 作者简介：
- 基金信息：
- DOI：
  CLC： TP391.4
- Received：17 December 2006，
  
  Revised：12 January 2007，
  
  Published Online：30 June 2007，
  
  Published：30 June 2007
- 稿件说明：
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WANG Quan-dai, DUAN Yu-gang, DING Yu-cheng, et al. Mark image geometric distortion calibration in alignment system for multilevel imprint lithography[J]. Optics and precision engineering, 2007, 15(3): 422-427.
DOI：

WANG Quan-dai, DUAN Yu-gang, DING Yu-cheng, et al. Mark image geometric distortion calibration in alignment system for multilevel imprint lithography[J]. Optics and precision engineering, 2007, 15(3): 422-427. DOI：

摘要

在综合分析了多种线性及非线性畸变后

建立了三次多项式图像系统畸变模型。采用基于控制点偏差目标函数最小优化法进行畸变模型的求解

并通过计算自标定偏差均方差与互标定偏差均方差对标定结果进行了评定。结果表明

模型求解误差为0.22 μm

通过校正标记图像几何畸变引入的定位误差由2.5 μm降低到0.25 μm

可实现压印对正系统中标记图像几何畸变的校正

实现精确定位。

Abstract

A distortion model based on cubic polynomial is established concerning various linear and nonlinear distortions in the alignment system based on video image for multi-level imprint lithography and a calibration technique based on controlled points is adopted to solve the model. By minimizing the error object function

the indeterminate coefficients of the distortion model are obtained. The calibration results are evaluated by the standard deviation of calibration error

and the results show that the fitting error is 0.22 μm. By introducing distortion correction based on this model

the alignment error due to image geometric distortion in the alignment system is reduced from 2.5 μm to 0.25 μm

which meets the requirement of precise positioning of alignment marks.

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references

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