Experimental  research on the micro electroforming of microstructure array

doi:null

您当前的位置：

首页 >

文章列表页 >

Experimental research on the micro electroforming of microstructure array

Article | 更新时间：2020-08-12

- Experimental research on the micro electroforming of microstructure array
- Optics and Precision Engineering Vol. 16, Issue 3, Pages: 473-477(2008)
- 作者机构：
  
  淮阴工学院机械工程系
- 作者简介：
- 基金信息：
- DOI：
  CLC：
- Received：11 September 2007，
  
  Revised：20 November 2007，
  
  Published Online：22 March 2008，
  
  Published：22 March 2008
- 稿件说明：
移动端阅览
郑晓虎,朱荻. 金属微结构阵列的电铸成型技术研究[J]. 光学精密工程, 2008,16(3):473-477

Experimental research on the micro electroforming of microstructure array[J]. Optics and precision engineering, 2008, 16(3): 473-477.
郑晓虎,朱荻. 金属微结构阵列的电铸成型技术研究[J]. 光学精密工程, 2008,16(3):473-477 DOI：

Experimental research on the micro electroforming of microstructure array[J]. Optics and precision engineering, 2008, 16(3): 473-477. DOI：

摘要

详细讨论了微结构的电铸特点，在分析微细电铸的电场与流场特性的基础上，深入研究了铸层厚度的不均匀现象及搅拌方式、电流密度对微细电铸质量的影响。得出：由于高深宽比胶膜存在，单一搅拌对电铸区域的影响只集中在微区的入口部分。扩散过程成为金属沉积的限制性因素；随着胶膜深宽比的增大，电场等势线弯曲的程度加大，导致电铸微区内金属离子传输能力不均匀。实验表明：微细电铸过程中，搅拌速度提高并不能改善金属沉积的传质条件，辅助超声的复合搅拌在相同条件下能提高金属沉积速度、减少铸层缺陷；最佳电流密度不宜超过0.9～1.0A/dm2。实现了高分辨率，侧壁陡直的金属微结构的电铸成型。

Abstract

Discussed the characteristics of the micro electroforming process systematically and analyzed the property of the electric field and flow field. The asymmetry of the electroforming and the effect of the stirring mode

current density on the microstructure were studied in detail. From experiment it can be concluded that the effect of the pure stirring reach the entrance of the micro groove only

diffusion is the control factors of micro electroforming. The equipotential line curvature of electric field grew with the increasing aspect ratio of the deposit. Which result in the discrepancy of ion transferring capacity in the reaction area. The results showed that the stirring velocity could not improve transferring condition

while complex stirring (assistant with ultrasound) could help to the deposit velocity and get the perfect microstructure. The optimal current density was less than 0.9～1.0A/dm2 in the process. Based on the research high resolute electroforming microstructure with vertical wall was fabricated.

关键词

Keywords

references

Views

下载量

CSCD

Alert me when the article has been cited

提交

Tools

Publicity Resources

Multi-state reliability modeling method for Tianwen-1 high-resolution camera

Design of optical film for ultra-thin MiniLED backlight modules

Design of micro-structure film for improving viewing brightness of vehicle head-up display

Occlusion image data generation system

Design of optical brightness enhancement film for direct-lit backlight in automobile head-up display

Related Author

Yan WANG

Tianyu SUN

Quanquan LUO

Yang LI

Xiaobo LI

Qi-bin FENG

Hui-li XIAO

Ling YANG

Related Institution

Space Department III， Changchun Institution of Optics，Fine Mechanics and Physics， Chinese Academy of Sciences

AVIC Hua Dong Photoelectric Co. Ltd.

Special Display and Imaging Technology Innovation Center of Anhui Province National Engineering Laboratory of Special Display Technology， Academy of Photoelectric Technology， Hefei University of Technology

School of Electronic Science &Applied Physics， Hefei University of Technology

School of Instrumentation and Opto-Electronics Engineering，Hefei University of Technology

AI问答

Address：No.3888 Dong Nanhu Road, Changchun, Jilin, China Postal code：130033
Tel：0431-86176855 Email：gxjmgc@ciomp.ac.cn
Technical support is provided by Beijing Founder electronics co., LTD 吉ICP备11002662号-17 京公网安备11010802024621
It is recommended to read the content of this site in Chrome&IE9+. Please switch to extreme mode in browser 360.
Cookies We use cookies to help provide and enhance our service and tailor content. By continuing, you agree to the use of cookies.

⁰