The Reflectivity Measurement of normal- incidence Mo/Si Multilayer mirrors in 13.9nm and 19.6nm

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The Reflectivity Measurement of normal- incidence Mo/Si Multilayer mirrors in 13.9nm and 19.6nm

Article | 更新时间：2020-08-12

- The Reflectivity Measurement of normal- incidence Mo/Si Multilayer mirrors in 13.9nm and 19.6nm
- Optics and Precision Engineering Vol. 16, Issue 9, Pages: 1666-1672(2008)
- 作者机构：
  
  长春光学精密机械与物理研究所
- 作者简介：
- 基金信息：
- DOI：
  CLC：
- Received：12 March 2008，
  
  Revised：19 June 2008，
  
  Published Online：25 September 2008，
  
  Published：25 September 2008
- 稿件说明：
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李敏,陈波. 13.9nm和19.6nm正入射Mo/Si多层膜反射镜反射率的测量[J]. 光学精密工程, 2008,16(9):1666-1672

The Reflectivity Measurement of normal- incidence Mo/Si Multilayer mirrors in 13.9nm and 19.6nm[J]. Optics and precision engineering, 2008, 16(9): 1666-1672.
李敏,陈波. 13.9nm和19.6nm正入射Mo/Si多层膜反射镜反射率的测量[J]. 光学精密工程, 2008,16(9):1666-1672 DOI：

The Reflectivity Measurement of normal- incidence Mo/Si Multilayer mirrors in 13.9nm and 19.6nm[J]. Optics and precision engineering, 2008, 16(9): 1666-1672. DOI：

摘要

根据理论模拟计算并设计了分别工作在13.9nm类镍银和19.6nm类氖锗两种X射线激光的Mo/Si多层膜，将自行设计的小型反射率计安装在Mcpherson247单色仪出射狭缝附近，组成以铜靶激光等离子体辐射源作为极紫外光源的反射率测量装置，对研制的Mo/Si多层膜反射镜的反射率进行了测量。实验结果显示，中心波长分别是13.91nm和19.60nm，相应反射率分别是41.9%和22.6%，半宽度分别是0.56nm和1.70nm，中心波长和半宽度与理论值基本一致。为了全面了解多层膜的性能，用WYKO测量多层膜的表面粗糙度，13.9nm和19.6nmMo/Si多层膜的表面粗糙度分别是0.52nm和0.55nm。

Abstract

Mo/Si multilayer mirrors were designed after theoretical simulation

whose central wavelength were 13.9nm Ni-like Ag and 19.6nm Ne-like Ge x-ray laser respectively. The reflectivity measuring set-up was composed of Mcpherson 247 monochromator and a small reflectometer. The Extreme Ultraviolet（EUV）source was copper-target Laser Produced Plasmas(LPP) source. The result showed that the central wavelength of Mo/Si multilayer mirrors were 13.91nm and 19.60nm respectively

the corresponding reflectivity were around 41.9% and 22.6%

and the related FWHM were 0.56nm and 1.70nm

the central wavelength and FWHM agreed with theoretical value basically. In order to study the Mo/Si multilayer performance

the measurement of surface roughness was carried out using WYKO

the surface roughness were 0.52nm for 13.9nm and 0.55nm for 19.6nm.

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Related Institution

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