Fabrication of high-aspect-ratio and high-density X-ray transmission grating

LIU Long-hua; LIU Gang; XIONG Ying; HUANG Xin-long; CHEN Jie; LI Wen-jie; TIAN Jin-ping; TI

doi:null

您当前的位置：

首页 >

文章列表页 >

Fabrication of high-aspect-ratio and high-density X-ray transmission grating

Article | 更新时间：2020-08-12

- Fabrication of high-aspect-ratio and high-density X-ray transmission grating
- Optics and Precision Engineering Vol. 17, Issue 1, Pages: 72-77(2009)
- 作者机构：
  
  中国科学技术大学国家同步辐射实验室, 安徽合肥 230029
- 作者简介：
- 基金信息：
- DOI：
  CLC： O436.1;TN305.7
- Received：01 September 2008，
  
  Revised：16 December 2008，
  
  Published Online：25 January 2009，
  
  Published：25 January 2009
- 稿件说明：
移动端阅览
柳龙华, 刘刚, 熊瑛, 黄新龙, 陈洁, 李文杰, 田金萍, 田扬超. 大高宽比、高线密度X射线透射光栅的制作[J]. 光学精密工程, 2009,17(1): 72-77

LIU Long-hua, LIU Gang, XIONG Ying, HUANG Xin-long, CHEN Jie, LI Wen-jie, TIAN Jin-ping, TIAN Yang-chao. Fabrication of high-aspect-ratio and high-density X-ray transmission grating[J]. Editorial Office of Optics and Precision Engineering, 2009,17(1): 72-77
柳龙华, 刘刚, 熊瑛, 黄新龙, 陈洁, 李文杰, 田金萍, 田扬超. 大高宽比、高线密度X射线透射光栅的制作[J]. 光学精密工程, 2009,17(1): 72-77 DOI：

LIU Long-hua, LIU Gang, XIONG Ying, HUANG Xin-long, CHEN Jie, LI Wen-jie, TIAN Jin-ping, TIAN Yang-chao. Fabrication of high-aspect-ratio and high-density X-ray transmission grating[J]. Editorial Office of Optics and Precision Engineering, 2009,17(1): 72-77 DOI：

摘要

利用电子束光刻、X射线光刻和微电镀技术

成功制作了面积为1 mm1 mm

周期为300 nm

金吸收体厚度为1 m的用于X射线显微成像的透射光栅。首先

利用电子束光刻和微电镀技术在Si

薄膜上制作周期为300 nm

厚度为250 nm的高线密度光栅掩模;然后

利用X射线光刻和微电镀技术复制厚度为1 m

占空比接近1∶1

高宽比为7的X射线透射光栅。整个工艺流程充分利用了电子束光刻技术制作高分辨率图形和X射线光刻技术制作大高宽比结构的优点

实现了大高宽比、纳米尺度、侧壁陡直的X射线透射光栅的制作。

Abstract

A transmission grating with an area of 1 mm 1 mm

a pitch of 300 nm

and a gold thickness of 1 m for X-ray imaging and microscopy is successfully fabricated by combining electron beam lithography

X-ray lithography

and electroplating. Firstly

a high-density mask in pitch of 300 nm and gold thicknes of 250 nm for transmission grating is originally patterned on the Si

membranes by electron beam lithography and electroplating. Then

the X-ray lithography and electroplating are used to replicate the transmission grating with the profile thickness of 1 m

aspect ratio of 7

and the duty cycle about 1∶1.Experimental results show that the fabrication method combining electron beam lithography

X-ray lithography and electroplating has advantages over other fabrication methods in big pitch

nanometer scale and straight side well for transmission grating.

关键词

Keywords

references

CHAO W L, HARTENECK B D, LIDDLE J A, et al.. Soft X-ray microscopy at a spatial resolution better than 15nm [J]. Nature, 2005,435:1210-1213.[2] CHU Y S, YI J M, CARLO F D, et al.. Hard-X-ray microscope with Fresnel zone plates reach 40nm Rayleigh resolution [J]. Applied Physics Letters, 2008,92:103-119.[3] CHEN J, WU C Y,TIAN J P, et al.. Three-dimensional imaging of a complex concaved cuboctahedron copper sulfide crystal by X-ray nanotomography [J]. Applied Physics Letters, 2008,92:233104.[4] KITCHENA M J, PAGANINA D, LEWISA R A, et al.. Analysis of speckle patterns in phase-contrast images of lung tissue [J]. Nuclear Instruments and Methods in Physics Research A, 20055,48:240-246.[5] TIMM W, ANA D, CHRISTIAN D, et al.. X-ray phase imaging with a grating interferometer [J]. Optics Express, 2005,13(16):6296-6304.[6] 巴音贺希格, 高键翔, 齐向东. 机械刻划长焦距凹面金属光栅的研制[J]. 光学精密工程, 2006,14(3):391-395. BAYINHESHIG, GAO J X, QI X D. Manufacturing for ruling concave metal grating with a long focal length [J]. Opt. Precision Eng., 2006,14(3):391-395. (in Chinese)[7] 赵博, 齐向东. 高效平面全息衍射光栅的获取方法 . 光学精密工程, 2001,9(2):109-114. ZHAO B, Q I X D. Manufacturing of high efficient holographic diffraction gratings [J]. Opt. Precision Eng., 2001,9(2):109-114. (in Chinese)[8] 吴文娟, 王占山, 秦树基,等. 窄光谱带宽X 射线刻蚀多层膜光栅 [J]. 光学精密工程, 2004, 12 (2):226-230. WU W J, WANG ZH SH, QIN SH J, et al.. Etching of multiplayer grating using a narrow spectral band X-ray [J]. Opt. Precision Eng., 2004,12(2):226-230. (in Chinese)[9] XU X D, HONG Y L, TIAN Y C, et al.. Fabrication of self-supporting transmission gratings for plasma diagnostics [J]. SPIE, 1999,3766:380-385.[10] KLEY E B, PARRIAUX O. E-beam tandem writes short-pitch DOEs and gratings for EU2922 FOTA and other optical Microsystems [J]. SPIE, 1996,2783:146-153.[11] SOLAK H H, DAVID C, GOBRECHT J, et al.. Sub-50nm period patterns with EUV interference lithography [J]. Microelectron Eng, 2003,67/68:56-62.[12] ZHU X L, WANG D Q, XIE C Q, et al.. Fabrication of X-ray diffractive optical elements for ICF target diagnosis [J]. SPIE, 2007,6722:672208.[13] ZHU X L, XIE C Q, YE T C, et al.. Fabrication of 200 nm period X-ray transmission gratings using electron beam lithography [J]. SPIE,2007,6832:68320V.

Views

552

下载量

CSCD

Alert me when the article has been cited

提交

Tools

Publicity Resources

No data

Related Author

No data

Related Institution

No data

AI问答

Address：No.3888 Dong Nanhu Road, Changchun, Jilin, China Postal code：130033
Tel：0431-86176855 Email：gxjmgc@ciomp.ac.cn
Technical support is provided by Beijing Founder electronics co., LTD 吉ICP备11002662号-17 京公网安备11010802024621
It is recommended to read the content of this site in Chrome&IE9+. Please switch to extreme mode in browser 360.
Cookies We use cookies to help provide and enhance our service and tailor content. By continuing, you agree to the use of cookies.

⁰