Optical properties of several fluoride materials

XUE Chun-rong; YI Kui; SHAO Jian-da; FAN Zheng-xiu

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Optical properties of several fluoride materials

Article | 更新时间：2020-08-12

- Optical properties of several fluoride materials
- Optics and Precision Engineering Vol. 17, Issue 7, Pages: 1507-1512(2009)
- 作者机构：
  
  1. 中国科学院上海光学精密机械研究所上海,201800
  2. 中国科技大学国家同步辐射实验室,安徽合肥,230019
  3. 常熟理工学院江苏新型功能材料实验室,江苏常熟,215500
- 作者简介：
- 基金信息：
- DOI：
  CLC： O484.4+1
- Received：29 August 2008，
  
  Revised：10 October 2008，
  
  Published Online：25 July 2009，
  
  Published：25 July 2009
- 稿件说明：
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薛春荣, 易葵, 邵建达, 范正修. 几种氟化物薄膜材料的光学特性[J]. 光学精密工程, 2009,17(7): 1507-1512

XUE Chun-rong, YI Kui, SHAO Jian-da, FAN Zheng-xiu. Optical properties of several fluoride materials[J]. Editorial Office of Optics and Precision Engineering, 2009,17(7): 1507-1512
薛春荣, 易葵, 邵建达, 范正修. 几种氟化物薄膜材料的光学特性[J]. 光学精密工程, 2009,17(7): 1507-1512 DOI：

XUE Chun-rong, YI Kui, SHAO Jian-da, FAN Zheng-xiu. Optical properties of several fluoride materials[J]. Editorial Office of Optics and Precision Engineering, 2009,17(7): 1507-1512 DOI：

摘要

为了进一步明确氟化薄膜材料在紫外(UV)-真空紫外(VUV)波段的光学常数

研究了真空紫外领域常用的基底材料和6种大带隙的氟化物薄膜材料的光学特性。分别在熔石英(JGS1)基底和氟化镁单晶基底上用热舟蒸发法以不同的沉积速率和不同的基底温度镀制了3种高折射率材料薄膜LaF

、NdF

、GdF

和3种低折射率材料薄膜MgF

、AlF

、Na

AlF

;在国家同步辐射真空紫外实验站测定了它们120~300 nm的透射光谱曲线

用商用lambda900光谱仪测量了它们190~500 nm的透射光谱曲线

两者相结合标定了透射率的准确值。用包络法和模拟退火相结合研究了它们在120~500 nm的折射率和消光系数

给出了6种氟化物材料的光谱色散曲线。结果显示

3种高折射率薄膜的折射率在157 nm处约为1.77~1.89

而3种低折射率薄膜的折射率在157 nm处约为1.44~1.48;研究表明

选用折射率相差较大的高、低折射率氟化物薄膜

可在膜系设计中组成高低折射率材料对

用于设计各种实用的薄膜器件。

Abstract

Several kind of wide band-gap fluoride materials are studied to determine optical constants of fluoride films in deep ultraviolet(VUV) to ultraviolet(UV). High-refractive-index materials LaF

NdF

and GdF

and low-refractive-index materials MgF

AlF

and Na

AlF

single thin films are deposited by a resistive-heating boat on JGS1 and single crystal MgF

substrates respectively at different deposited rates and specific substrate temperatures. Transmittances of all fluoride thin films are measured through a commercial spectrometer in the ambient atmosphere and wavelength regions from 190 nm to 500 nm

and measured through synchrotron radiation under vacuum in the wavelength regions from 120 nm to 300 nm. The optical constants of these materials are determined by a envelope method and a simulated annealing method

which matches the calculated and measured values of the transmittance.Measured results indicate that the refractive indexes are about 1.77~1.89 at 157 nm for LaF

NdF

and GdF

single layer films

and are about 1.44~1.48 at 157 nm for MgF

AlF

and Na

AlF

single layer films. Experiments show also that these high and low index materials can be composited to material pairs to design and manufacture the cost-effective

mechanically and optically stable optical coatings in 120 nm to 500 nm for new thin devices.

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references

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