Manufacture for light splitting grating in optical disk based on precision ruling and thin film deposition

WU Na; ZHANG Shan-wen; SONG Ke-ping; Bayanheshig; QI Xiang-dong; GAO Jian-xiang

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Manufacture for light splitting grating in optical disk based on precision ruling and thin film deposition

Article | 更新时间：2020-08-12

- Manufacture for light splitting grating in optical disk based on precision ruling and thin film deposition
- Optics and Precision Engineering Vol. 17, Issue 7, Pages: 1497-1501(2009)
- 作者机构：
  
  1. 中国科学院长春光学精密机械与物理研究所,吉林长春,中国,130033
  2. 中国科学院研究生院北京,100039
  3. 清华大学精密仪器与机械学院北京,100034
- 作者简介：
- 基金信息：
- DOI：
  CLC： O436.1;TN305.7
- Received：16 December 2008，
  
  Revised：06 February 2009，
  
  Published Online：25 July 2009，
  
  Published：25 July 2009
- 稿件说明：
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吴娜, 张善文, 宋可平, 巴音贺希格, 齐向东, 高键翔. 基于精密刻划及薄膜沉积技术的光盘分束光栅研制[J]. 光学精密工程, 2009,17(7): 1497-1501

WU Na, ZHANG Shan-wen, SONG Ke-ping, Bayanheshig, QI Xiang-dong, GAO Jian-xiang. Manufacture for light splitting grating in optical disk based on precision ruling and thin film deposition[J]. Editorial Office of Optics and Precision Engineering, 2009,17(7): 1497-1501
吴娜, 张善文, 宋可平, 巴音贺希格, 齐向东, 高键翔. 基于精密刻划及薄膜沉积技术的光盘分束光栅研制[J]. 光学精密工程, 2009,17(7): 1497-1501 DOI：

WU Na, ZHANG Shan-wen, SONG Ke-ping, Bayanheshig, QI Xiang-dong, GAO Jian-xiang. Manufacture for light splitting grating in optical disk based on precision ruling and thin film deposition[J]. Editorial Office of Optics and Precision Engineering, 2009,17(7): 1497-1501 DOI：

摘要

给出了采用光栅刻划和镀膜技术相结合研制光盘分束光栅的方法。采用光栅刻划机在金属膜上刻制占宽比为0.5的黑白光栅

并由黑白光栅翻制出制作光盘分束光栅的掩模版。通过掩模版对涂覆在K9玻璃基底上的光刻胶实施曝光和显影形成光刻胶矩形浮雕光栅

在理论设计的误差允许范围内

对此浮雕光栅沉积SiO

薄膜

去除残余光刻胶后得到SiO

矩形光栅母版

再经复制工艺制作了环氧树脂光盘分束光栅。测试结果表明

利用光盘分束光栅的纵向和横向加工误差的互补性

可以将光栅辅助光束与读写主光束强度之比的误差控制在0.03之内。

Abstract

A manufacturing method for a light splitting grating based on precision ruling and thin film deposition technologies was presented. The black-white grating with a duty cycle of 0.5 was ruled by a ruling machine on the metal film

then

it was fabricated into a mask for the light splitting grating. After exposuring and developing photoresist on the K9 glass behind the mask

the rectangle relief grating consisting of photoresists was formed. In the range of theory design error

a SiO

rectangle grating master could be obtained a after SiO

film was deposited on the relief grating and the rest photoresists were removed.Finally

an epoxide resin light splitting grating was duplicated successfully. The experimental results show that the error of the intensity ratio of secondary light beam to read-write main light beam can be controlled in 0.03 by using the complementarity of the mismatching tolerance between lengthwise direction and cross direction of the light splitting grating.

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references

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