Vacuum-ultraviolet Blazed Silicon Grating Anisotropically Etched in KOH Solution

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Vacuum-ultraviolet Blazed Silicon Grating Anisotropically Etched in KOH Solution

Article | 更新时间：2020-08-12

- Vacuum-ultraviolet Blazed Silicon Grating Anisotropically Etched in KOH Solution
- Optics and Precision Engineering Vol. 18, Issue 1, Pages: 94-99(2010)
- 作者机构：
  
  中国科学技术大学国家同步辐射实验室2. 中国科学技术大学3. 中国科技大学国家同步辐射实验室
- 作者简介：
- 基金信息：
- DOI：
  CLC： TH74;TN305
- Received：22 April 2009，
  
  Revised：24 June 2009，
  
  Published Online：22 January 2010，
  
  Published：22 January 2010
- 稿件说明：
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盛斌,徐向东,刘颖,洪义麟,付绍军. 真空紫外闪耀硅光栅的制作[J]. 光学精密工程, 2010,18(1):94-99

Vacuum-ultraviolet Blazed Silicon Grating Anisotropically Etched in KOH Solution[J]. Optics and precision engineering, 2010, 18(1): 94-99.
盛斌,徐向东,刘颖,洪义麟,付绍军. 真空紫外闪耀硅光栅的制作[J]. 光学精密工程, 2010,18(1):94-99 DOI：

Vacuum-ultraviolet Blazed Silicon Grating Anisotropically Etched in KOH Solution[J]. Optics and precision engineering, 2010, 18(1): 94-99. DOI：

摘要

摘要：本文基于单晶硅在KOH溶液中的各向异性刻蚀的特性，在相对于Si（111）面偏向切割5度的单晶片上制作1200线/毫米的闪耀光栅。工艺上结合全息干涉以及光刻胶灰化技术，得到小占宽比、平滑且干净的光刻胶掩模，用湿法刻蚀将光栅图形转移到硅单晶表面的天然氧化层上，并将其作为硅各向异性刻蚀的掩模，成功获得接近于理想槽形的锯齿形闪耀光栅。经过原子力显微镜对闪耀面进行分析，表面均方根粗糙度约为0.2nm，这对光栅在短波光学上的应用显得尤为重要。经过真空紫外波段的效率测量，发现光栅在135nm波长处显示出良好的闪耀特性。此方法可以应用于极紫外和软X射线波段的光栅制作上，在获得较高的槽形效率的同时，可以大大减少其制作难度及成本。

Abstract

Abstract: Combined with the technigue of holographic interference and the ashing of photoresist

a straight and clean mask of phtoresist with small line-to-period can be fabricated on off-cut silicon (111) wafers. We present a simple and convenient method of controlling the profile of a blazed grating that consists of using patterned native oxide layer as the mask of anisotropic etching to obtain near-ideal grooves of sawtooth. With the blazed grating profile well controlled by this technique

a 1200 g/mm blazed grating was fabricated

which had a blaze angle of 5.0° and smooth blaze facets of about 0.2 nm rms. The grating was measured to blaze at the wavelength of 135 nm. It is believed that high-groove-efficiency blazed gratings used in the wavelengths of extreme ultraviolet and soft x-ray can be easily fabricated by this method at normal or near normal incidence.

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Related Institution

Changchun Institute of Optics， Fine Mechanics and Physics， Chinese Academy of Sciences

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Anhui Institute of Optics and Fine Mechanics, Chinese Academy of Sciences

University of Science and Technology of China

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