A new microfabrication technology based on the PMMA（polymethylmethacrylate）microneedles has been presented，that was based on PCT technology with X-ray and lithography mask. By moving lithography mask

three-dimensional PMMA microstructures can be made. The fabricated shape had a direct dependence on the absorber on X-ray mask pattern. From the experiment

the final microstructure was not the same as the absorber pattern on X-ray mask. If there is no compensation for mask design

the deformed shapes of sloped side-wall on the exposed structures were observed

this would affect the performance of microneedles. The reason of the deformed shapes of sloped side-wall mainly analyzed in this paper was the nonlinear relationship between developing time and exposure energy. Base on the compensation of the mask pattern

the strength of microneedle with the channels was improved by changing the mask pattern from a hollow double right-triangular pattern to a hollow double semi- elliptic pattern.