Abstract: A Schwarzschild microscope working at 13.5 nm is developed. According to the theory of coaxial two-mirror system

the optical structure of Schwarzschild objective is designed by eliminating third-order spherical aberrations

coma and astigmatism. Spatial resolution of the designed objective achieves 550 lp/mm within the field of ±0.3 millimeter with respect to the calculation of modular transfer function. Based on the working wavelength and incidence angle of light

Mo/Si multilayer optics with reflectivity of 61% at 13.5 nm is designed and fabricated. In order to remove visible and ultraviolet light

filter with material of Zr

Si and Si3N4 is designed and fabricated

transmittance of the filter at 13.5 nm is 21.1%. With the purpose of demonstrating the resolution of microscope

the 60 lp/mm grid backlit by laser produced plasma is imaging via Schwarzschild microscope on charge coupled device (CCD)

and the results show that the imaging system can achieve the resolution of 3 μm in the 0.5 mm field. The resolution of imaging experiment is limited by the resolution of CCD camera.