Simulation for Vertical Monochromator of Neutron Diffraction Residual Stress Instrument

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Simulation for Vertical Monochromator of Neutron Diffraction Residual Stress Instrument

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- Simulation for Vertical Monochromator of Neutron Diffraction Residual Stress Instrument
- Optics and Precision Engineering Vol. 16, Issue 10, Pages: 1880-1885(2008)
- 作者机构：
  
  核物理与化学研究所
- 作者简介：
- 基金信息：
- DOI：
  CLC：
- Received：25 January 2008，
  
  Revised：15 March 2008，
  
  Published Online：25 October 2008，
  
  Published：25 October 2008
- 稿件说明：
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王晓影,李建,谢超美,刘荣. 中子衍射应力谱仪的垂直聚焦单色器的优化设计[J]. 光学精密工程, 2008,16(10):1880-1885

Simulation for Vertical Monochromator of Neutron Diffraction Residual Stress Instrument[J]. Optics and precision engineering, 2008, 16(10): 1880-1885.
王晓影,李建,谢超美,刘荣. 中子衍射应力谱仪的垂直聚焦单色器的优化设计[J]. 光学精密工程, 2008,16(10):1880-1885 DOI：

Simulation for Vertical Monochromator of Neutron Diffraction Residual Stress Instrument[J]. Optics and precision engineering, 2008, 16(10): 1880-1885. DOI：

摘要

本文应用蒙特卡罗模拟程序MCSTAS对中子衍射应力谱仪的垂直聚焦单色器利用单晶Ge（511）进行聚焦的情况进行了优化计算，得到垂直聚焦单色器的高度和单晶片间的倾角等参数的最佳值；同时对比分析了垂直聚焦单色器与平板单色器两种情况下样品处的中子注量率。最后讨论了单色器起飞角对谱仪分辨率产生的影响。

Abstract

This paper has reported a Monte Carlo simulation for vertical focusing monochromator Ge (511) of neutron diffraction residual stress instrument. The factors which will influence performance of instrument

such as the height of the monochromator and the angle between two crystals

have been investigated. Also the two conditions with the vertical focusing monochromator and with the flat monochromator which will affect the flux of sample table have been compared. At last the resolution of instrument is considered.

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Related Institution

中科院上海应用物理研究所2. 中科院长春光学精密机械与物理研究所

长春光机所应用光学国家重点实验室

Xi'an Institute of Optics and Precision Mechanics, Chinese Academy of Scienese

Xi'an Institute of Optics and Precision Mechanics, Academia Sinica

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