A compact soft x-ray and extreme ultraviolet (EUV)reflectometer system using a laser produced-plasma (LPP) light source with liquid-jet target have been built based on the requirement on high-precision reflectance measurement of multilayer mirrors for use in an EUV imager which is a payload of CHANGE plan. This reflectometer is mainly composed of a LPP light source
Mcpherson 247 type grazing-incidence monochromator with moving exit slit and correlative data collection system. The monochromator have 1-125nm wavelength range and less than 0.08nm spectral resolution. In comparison with metal target LPP source
the usage of debris-free liquid-jet target LPP source avoid destroying optical elements near the light source
while the use of grazing-incidence monochromator with moving exit slit improve both wavelength range and spectral resolution. At the same time the measurement results of Mo/Si multilayer coatings reflectance with central wavelength 13.5nm and 30.4nm also are given. The curves of reflectance Vs. wavelength of Mo/Si multilayer coatings show the repeatability of the reflectance measurement is better than ±0.5%.
Calibration of deposition rates of multilayer coatings by sputtering depositions
Soft X-ray reflectometer based on laser-produced plasma source with a gas-jet target
Related Author
ZHANG Li-chao
NI Qi-liang
QI Li-hong
CHEN Bo
Related Institution
State Key Laboratory of Applied Optics, Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences. Changchun 130033, China
State Key Lab of Applied Optics, Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences